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Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 54-60

Preparation and characterization of high-performance direct current magnetron sputtered ZnO:Al films

(6) Wang, W W a Diao, X G a Wang, Z a Yang, M a Wang, T M a Wu, Z a

a BEIHANG UNIVERSITY (China)

Author keywords

Reactive magnetron sputtering; Transparent conductive oxides; ZnO:Al films

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; GLASS; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACES; SYNTHESIS (CHEMICAL); TEMPERATURE DISTRIBUTION; THICKNESS MEASUREMENT; X RAY DIFFRACTION; ZINC OXIDE;

DIRECT CURRENT; REACTIVE MAGNETRON SPUTTERING; TRANSPARENT CONDUCTIVE OXIDES; ZNO:AL FILMS;

THIN FILMS;

EID: 25144498461 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.05.021 Document Type: Article

Times cited : (88)

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