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Volumn 14, Issue 1, 2011, Pages 23-27

Effect of deposition power on structural and electrical properties of Al-doped ZnO films using pulsed direct-current magnetron sputtering with single cylindrical target

Author keywords

Al doped ZnO; Cylindrical target; Deposition rate; Pulsed dc magnetron sputtering; Structural and electrical properties

Indexed keywords

AL-DOPED ZNO; AR ATOM; AZO FILMS; COST TRANSPARENT; CYLINDRICAL TARGET; DEPOSITION POWER; DIRECT-CURRENT MAGNETRON SPUTTERING; ELECTRONIC DEVICE; ENERGETIC PARTICLES; HIGH-QUALITY FILMS; OXYGEN IONS; PULSED DC MAGNETRON SPUTTERING; SPUTTERING POWER; STOICHIOMETRIC RATIO; STRUCTURAL AND ELECTRICAL PROPERTIES; ZNO;

EID: 79952617889     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2010.12.013     Document Type: Article
Times cited : (17)

References (22)
  • 19
    • 79952627565 scopus 로고    scopus 로고
    • JCPDS Card no. 36-1451
    • JCPDS Card no. 36-1451.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.