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Volumn 14, Issue 1, 2011, Pages 23-27
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Effect of deposition power on structural and electrical properties of Al-doped ZnO films using pulsed direct-current magnetron sputtering with single cylindrical target
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Author keywords
Al doped ZnO; Cylindrical target; Deposition rate; Pulsed dc magnetron sputtering; Structural and electrical properties
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Indexed keywords
AL-DOPED ZNO;
AR ATOM;
AZO FILMS;
COST TRANSPARENT;
CYLINDRICAL TARGET;
DEPOSITION POWER;
DIRECT-CURRENT MAGNETRON SPUTTERING;
ELECTRONIC DEVICE;
ENERGETIC PARTICLES;
HIGH-QUALITY FILMS;
OXYGEN IONS;
PULSED DC MAGNETRON SPUTTERING;
SPUTTERING POWER;
STOICHIOMETRIC RATIO;
STRUCTURAL AND ELECTRICAL PROPERTIES;
ZNO;
ALUMINUM;
CYLINDERS (SHAPES);
DC POWER TRANSMISSION;
DEPOSITION RATES;
GALVANOMAGNETIC EFFECTS;
HALL MOBILITY;
MAGNETRON SPUTTERING;
OPTICAL FILMS;
OXYGEN;
ZINC OXIDE;
ELECTRIC PROPERTIES;
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EID: 79952617889
PISSN: 13698001
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mssp.2010.12.013 Document Type: Article |
Times cited : (17)
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References (22)
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