Sputtering of ZnO:Al films from dual tube targets with tilted magnetrons

Thin Solid Films

Volumn 519, Issue 7, 2011, Pages 2366-2370

  Zhu, H ^a,b   Bunte, E ^a   Hupkes J ^a   Huang, S M ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b East China Normal University   (China)

Author keywords

Magnetron sputtering; Wet etching; ZnO:Al films

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; CHEMICAL ETCHING; DEPOSITED FILMS; DISCHARGE POWER; DUAL TUBE; DYNAMIC MODES; ELECTRICAL PROPERTY; LATERAL VARIATIONS; MATERIAL PROPERTY; MID-FREQUENCY; PLASMA PHYSICS; ROTATING TUBES; TILT ANGLE; WET-CHEMICAL ETCHING; ZNO; ZNO:AL FILMS;

ALUMINUM; ALUMINUM COATINGS; DEPOSITION RATES; DYNAMICS; ELECTRIC COILS; ELECTRIC PROPERTIES; HYDROCHLORIC ACID; METALLIC FILMS; OXIDE FILMS; ZINC OXIDE;

WET ETCHING;

EID: 78751642393     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.10.072     Document Type: Article

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