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Plasma Processes and Polymers

Volumn 7, Issue 11, 2010, Pages 910-914

Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

(5) Pokorný, Petr a Bulír̂, Jir̂í a Lanĉok, Ján a Musil, Jindr̂ich a Novotný, Michal a

a INSTITUTE OF PHYSICS (Czech Republic)

Author keywords

aluminium oxide; ion energy distribution function; magnetron; mass spectrometry; pulsed discharges

Indexed keywords

ALUMINIUM OXIDE; CONSTANT POWER; ION COMPOSITION; MAGNETRON DISCHARGES; NEGATIVE OXYGEN IONS; OPTICAL SPECTROSCOPY; OXIDE MODE; OXYGEN ATOM; OXYGEN FLOW RATES; PULSED DISCHARGE; PULSED MAGNETRON DISCHARGES; REACTIVE MAGNETRON SPUTTERING; REPETITION FREQUENCY;

ALUMINUM; DC POWER TRANSMISSION; DISTRIBUTION FUNCTIONS; ELECTRIC POWER DISTRIBUTION; ION BEAMS; IONS; MASS SPECTROMETRY; METALLIC COMPOUNDS; OXIDES; OXYGEN; SPECTROMETERS;

OXIDE FILMS;

EID: 78649533290 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.201000064 Document Type: Article

Times cited : (19)

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