Reactive deposition of aluminium-doped zinc oxide thin films using high power pulsed magnetron sputtering

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4472-4477

  Ruske, F ^a   Pflug, A ^a   Sittinger, V ^a   Werner, W ^a   Szyszka, B ^a   Christie, D J ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b Advanced Energy Industries Incorporated   (United States)

Author keywords

Al doped ZnO; HPPMS; Ionized PVD; Process control

Indexed keywords

ALUMINUM COMPOUNDS; DOPING (ADDITIVES); MAGNETRON SPUTTERING; ZINC OXIDE;

AL-DOPED ZNO; HPPMS; IONIZED PVD; REACTIVE DEPOSITION;

THIN FILMS;

EID: 42649093542     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.019     Document Type: Article

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