DC reactive sputtering of aluminium doped zinc oxide films for solar modules controlled by target voltage

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1204-1207

  Koble Ch ^a   Greiner, D ^a   Klaer, J ^a   Klenk, R ^a   Meeder, A ^b   Ruske, F ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b Sulfurcell Solartechnik GmbH   (Germany)

Author keywords

Reactive sputtering; Target voltage; ZnO

Indexed keywords

CERAMIC TARGET; DC REACTIVE SPUTTERING; DUAL MAGNETRONS; MODULE TEST STRUCTURE; MONOLITHICALLY INTEGRATED; OPTICAL AND ELECTRICAL PROPERTIES; OXYGEN FLOW; PROCESS OPTIMISATION; REFERENCE FILMS; SCALING-UP; SOLAR MODULE; SPUTTERED FILMS; TARGET VOLTAGE; ZNO;

COPPER COMPOUNDS; COST REDUCTION; ELECTRIC PROPERTIES; MONOLITHIC INTEGRATED CIRCUITS; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; REACTIVE SPUTTERING; SEMICONDUCTING ZINC COMPOUNDS; TARGETS; ZINC; ZINC OXIDE;

PROCESS CONTROL;

EID: 71649091670     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.05.055     Document Type: Article

References (7)

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