Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

Journal of Optoelectronics and Advanced Materials

Volumn 12, Issue 3, 2010, Pages 697-700

  Novotny M ^a   Bulir J ^a   Pokorny P ^a   Bocan, J ^a   Fitl, P ^a   Lancok, J ^a   Musil, J ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Alumina; Mass spectroscopy; Optical emission spectroscopy; Plasma spectroscopy; Reactive magnetron sputtering

Indexed keywords

ALUMINA; ALUMINUM METALLOGRAPHY; ALUMINUM OXIDE; LIGHT EMISSION; MAGNETRON SPUTTERING; MASS SPECTROMETERS; MASS SPECTROMETRY; OXYGEN; PLASMA DIAGNOSTICS; POSITIVE IONS;

EMISSION SPECTRUMS; MASS SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPIES (OES); OPTICAL EMISSIONS; PLASMA COMPOSITION; PLASMA SPECTROSCOPY; PULSED MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING;

OPTICAL EMISSION SPECTROSCOPY;

EID: 77950638049     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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