Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity

Optics Express

Volumn 19, Issue 7, 2011, Pages 6714-6723

  Ge, Weihao ^a   Wang, Chinhua ^a   Xue, Yinfei ^a   Cao, Bing ^a   Zhang, Baoshun ^b   Xu, Ke ^b  

^a SOOCHOW UNIVERSITY   (China)

^b SUZHOU INSTITUTE OF NANO TECH AND NANO BIONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY RESONATORS; COPYING; PHOTORESISTS;

CAVITY LENGTH; CAVITY SYSTEM; DISPERSION RELATIONS; INTERFEROMETRIC PATTERN; METALLIC GRATINGS; NUMERICAL SIMULATION; OPTICAL RESOLUTION; PHOTORESIST LAYERS; RESONANT CAVITY; SUB-WAVELENGTH; SURFACE PLASMON TECHNIQUES; SURFACE PLASMONS; THIN FILM LAYERS; TUNABILITIES; TUNING CAPABILITY;

PLASMONS;

METAL; NANOMATERIAL;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; NANOTECHNOLOGY; PHOTOGRAPHY; SURFACE PLASMON RESONANCE; ULTRASTRUCTURE;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; METALS; NANOSTRUCTURES; NANOTECHNOLOGY; PHOTOGRAPHY; SURFACE PLASMON RESONANCE;

EID: 79953182025     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.006714     Document Type: Article

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