Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers

Applied Physics Letters

Volumn 93, Issue 11, 2008, Pages

  Xiong, Yi ^a   Liu, Zhaowei ^a   Zhang, Xiang ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; LIGHT; METALS; STRUCTURAL METALS; TWO DIMENSIONAL;

DIFFRACTION-LIMITED; FLEXIBLE DESIGNS; LIGHT ILLUMINATION; METAL-DIELECTRIC MULTILAYERS; MULTI-LAYER STRUCTURES; ONE-DIMENSIONAL; PERIODIC PATTERNS; SUB-WAVELENGTH;

MULTILAYERS;

EID: 52349100505     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2985898     Document Type: Article

References (35)

1. A. K. Bates, M. Rothschild, T. M. Bloomstein, T. H. Fedynyshyn, R. R. Kunz, V. Liberman, and M. Switkes, IBM J. Res. Dev. IBMJAE 0018-8646 45, 605 (2001).
2. C. W. Gwyn, R. Stulen, D. Sweeney, and D. Attwood, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.590453 16, 3142 (1998).
3. J. P. Silverman, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.590452 16, 3137 (1998).
4. C. Vieu, F. Carcenac, A. Pepin, Y. Chen, M. Mejias, A. Lebib, L. Manin-Ferlazzo, L. Couraud, and H. Launois, Appl. Surf. Sci. ASUSEE 0169-4332 10.1016/S0169-4332(00)00352-4 164, 111 (2000).
5. J. Melngailis, A. A. Mondelli, I. L. Berry, and R. Mohondro, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.590052 16, 927 (1998).
6. R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science SCIEAS 0036-8075 10.1126/science.283.5402.661 283, 661 (1999).
7. D. S. Ginger, H. Zhang, and C. A. Mirkin, Angew. Chem. ANCEAD 0044-8249 10.1002/ange.200300608 43, 30 (2004).
8. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science SCIEAS 0036-8075 10.1126/science.274.5284.85 272, 85 (1996).
9. H. Schift, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.2890972 26, 458 (2008).
10. R. J. Blaikie and S. J. McNab, Appl. Opt. APOPAI 0003-6935 10.1364/AO.40.001692 40, 1692 (2001).
11. W. Srituravanich, N. Fang, C. Sun, Q. Luo, and X. Zhang, Nano Lett. NALEFD 1530-6984 10.1021/nl049573q 4, 1085 (2004).
12. X. G. Luo and T. Ishihara, Opt. Express OPEXFF 1094-4087 142, 3055 (2004).
13. Z. W. Liu, Q. H. Wei, and X. Zhang, Nano Lett. NALEFD 1530-6984 10.1021/nl0506094 5, 957 (2005).
14. W. Srituravanich, S. Durant, H. Lee, C. Sun, and X. Zhang, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.2091088 23, 2636 (2005).
15. D. B. Shao and S. C. Chen, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1951052 86, 253107 (2005).
16. A. Sundaramurthy, P. J. Schuck, N. R. Conley, D. P. Fromm, G. S. Kino, and W. E. Moerner, Nano Lett. NALEFD 1530-6984 10.1021/nl052322c 6, 355 (2006).
17. L. Wang, S. M. Uppuluri, E. X. Jin, and X. F. Xu, Nano Lett. NALEFD 1530-6984 10.1021/nl052371p 6, 361 (2006).
18. W. L. Barnes, A. Dereux, and T. W. Ebbesen, Nature (London) NATUAS 0028-0836 10.1038/nature01937 424, 824 (2003).
19. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, and D. R. S. Cumming, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125388 75, 3560 (1999).
20. J. G. Goodberlet and H. Kavak, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1495538 81, 1315 (2002).
21. D. O. S. Melville and R. J. Blaikie, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.1813462 22, 3470 (2004).
22. R. A. Shelby, D. R. Smith, and S. Schultz, Science SCIEAS 0036-8075 10.1126/science.1058847 292, 77 (2001).
23. D. Schurig, J. J. Mock, B. J. Justice, S. A. Cummer, J. B. Pendry, A. F. Starr, and D. R. Smith, Science SCIEAS 0036-8075 10.1126/science.1133628 314, 977 (2006).
24. Z. W. Liu, H. Lee, Y. Xiong, C. Sun, and X. Zhang, Science SCIEAS 0036-8075 10.1126/science.1137368 315, 1686 (2007).
25. N. N. Lepeshkin, A. Schweinsberg, G. Piredda, R. S. Bennink, and R. W. Boyd, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.93.123902 93, 123902 (2004).
26. P. A. Belov and Y. Hao, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.73.113110 73, 113110 (2006).
27. B. Wood, J. B. Pendry, and D. P. Tsai, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.74.115116 74, 115116 (2006).
28. H. C. Shin and S. H. Fan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2360187 89, 151102 (2006).
29. M. Scalora, M. J. Bloemer, A. S. Pethel, J. P. Dowling, C. M. Bowden, and A. S. Manka, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.366996 83, 2377 (1998).
30. E. N. Economou, Phys. Rev. PHRVAO 0031-899X 10.1103/PhysRev.182.539 182, 539 (1969).
31. I. Avrutsky, I. Salakhutdinov, J. Elser, and V. Podolskiy, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.75.241402 75, 241402 (2007).
32. Y. Xiong, Z. W. Liu, C. Sun, and X. Zhang, Nano Lett. NALEFD 1530-6984 10.1021/nl0716449 7, 3360 (2007).
33. P. B. Johnson and R. W. Christy, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.6.4370 6, 4370 (1972).
34. E. D. Palik, Handbook of Optical Constants of Solids (San Diego, Academic, 1998).
35. M. J. Madou, Fundamentals of Microfabrication (CRC, Boca Raton, 2002).