Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure

Journal of Optics A: Pure and Applied Optics

Volumn 12, Issue 4, 2010, Pages

  Yang, Xuefeng ^a   Fang, Liang ^a   Zeng, Beibei ^a   Wang, Changtao ^a   Feng, Qin ^a   Luo, Xiangang ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTED WAVES; HETEROSTRUCTURES; HIGH QUALITY; ILLUMINATION LIGHT; INTERFERENCE PATTERNS; METALLIC GRATINGS; PATTERN RESOLUTION; SUB-WAVELENGTH; SURFACE PLASMON POLARITONS; EXPENSIVE EQUIPMENTS;

DIFFRACTION GRATINGS; FINITE DIFFERENCE TIME DOMAIN METHOD; PHONONS; PHOTOLITHOGRAPHY; PHOTONS; PLASMONS; QUANTUM THEORY; WAVEGUIDES; ELECTROMAGNETIC WAVE POLARIZATION; OPTICAL WAVEGUIDES; PHOTORESISTS; SURFACE PLASMONS; TIME DOMAIN ANALYSIS; WAVE INTERFERENCE;

SURFACE PLASMON RESONANCE;

EID: 77950571297     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/2040-8978/12/4/045001     Document Type: Article

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