Surface plasmon interference nanolithography

Nano Letters

Volumn 5, Issue 5, 2005, Pages 957-961

  Liu, Zhao Wei ^a   Wei, Qi Huo ^b   Zhang, Xiang ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LIGHT (EUV); SURFACE PLASMON INTERFERENCE NANOLITHOGRAPHY (SPIN); SURFACE PLASMON WAVES; WAVE VECTORS;

APPROXIMATION THEORY; COMPUTER SIMULATION; DIFFRACTION; NANOSTRUCTURED MATERIALS; REDUCTION; SURFACE PLASMON RESONANCE; VECTORS; X RAY ANALYSIS;

NANOTECHNOLOGY;

NANOMATERIAL;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CRYSTALLIZATION; EQUIPMENT DESIGN; METHODOLOGY; NANOTECHNOLOGY; PHOTOCHEMISTRY; PHOTOGRAPHY; REFRACTOMETRY; SURFACE PLASMON RESONANCE; SURFACE PROPERTY; ULTRASTRUCTURE;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; CRYSTALLIZATION; EQUIPMENT DESIGN; MODELS, CHEMICAL; NANOSTRUCTURES; NANOTECHNOLOGY; PHOTOCHEMISTRY; PHOTOGRAPHY; REFRACTOMETRY; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES;

EID: 19944402188     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0506094     Document Type: Article

References (25)

1. Seidel P.; Canning J.; Mackay S.; Trybula W. Semiconductor FabTech 1998, 7, 147; (http://www.semiconductorfabtech.com/features/lithography/articles/ body7.147.php3).
2. Schellenberg, F. M. Proc. SPIE, 2004, 5377, 1; Smith, B. W., Ed.
3. Mack, C. A. Proc. SPIE 2004, 5374, 1; Mackay, R. S., Ed.
4. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Science 2001, 272, 85.
5. Bailey, T. et al. J. Vac. Sci. Technol. B 2000, 18, 3572.
6. Gwyn, C. W.; Stulen, R.; Sweeney, D.; Attwood, D. J. Vac. Sci. Technol B 1998, 16, 3142.
7. Bates, A. K. et al. IBM J. Res. Dev. 2001, 45, 605.
8. Silverman, J. P. J. Vac. Sci. Technol. B 1998, 16, 3137.
9. Hoffnagle, J. A.; Hinsberg, W. D.; Sanchez, M.; Houle, F. A. J. Vac. Sci. Technol. B 1999, 17, 3306.
10. Switkes, M.; Rothschild, M. J. Vac. Sci. Technol. B 2001, 19, 2353.
11. Ghislain, L. P. et al. Appl. Phys. Lett. 1999, 74, 501.
12. Wei, Q. H.; Liu, Z. W.; Luo, Q.; Zhang, X. UCLA invention disclosure 2003, case number 2003-309, (http://www.research.ucla.edu/tech/ucla03-309.htm).
13. Srituravanich, W.; Fang, N.; Sun, C.; Luo, Q.; Zhang, X. Nano Lett. 2004, 4, 1085.
14. Srituravanich, W. et al. J. Vac. Sci. Technol. B 2004, 22, 3475.
15. Raether H. Surface Plasmons; Springer-Verlag: Berlin, 1988.
16. Luo, X. G.; Ishihara, T. Appl. Phys. Lett. 2004, 84, 4780.
17. Luo, X. G.; Ishihara, T. Opt. Express 2004, 12, 3055.
18. Johnson, P. B.; Christy, R. W. Phys. Rev. B 1972, 6, 4370.
19. Savas, T. A.; Farhoud, M.; Smith, H. I.; Hwang, M.; Ross, C. A. J. Appl. Phys. 1999, 85, 6160.
20. Farhoud, M.; et al. J. Vac. Sci. Technol. B 1999, 17, 3182.
21. Solak, H. H.; et al. Microelectron. Eng. 2003, 67-68, 56.
22. Madou Marc, J. Fundamentals of Microfabrication; CRC Press, Boca Raton, 2002.
23. Bouhelier, A. et al. J. Microscopy 1999, 194, 571.
24. Kik, P. G.; Martin, A. L.; Maier, S. A.; Atwater, H. A. Proc. SPIE 2002, 4810.
25. Yin, X. B.; Fang, N.; Zhang, X.; Martini, I. B.; Schwartz, B. J. Appl. Phys. Lett. 2002, 81, 3663.