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Volumn 308, Issue 5721, 2005, Pages 534-537

Sub-diffraction-limited optical imaging with a silver superlens

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE PROCESSING; LENSES; NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; SPECTRUM ANALYSIS; SURFACE PLASMON RESONANCE; THICKNESS CONTROL; WAVES;

EID: 17644419669     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1108759     Document Type: Article
Times cited : (3869)

References (33)
  • 11
    • 1542377441 scopus 로고    scopus 로고
    • T.-J. Yen et al., Science 303, 1494 (2004).
    • (2004) Science , vol.303 , pp. 1494
    • Yen, T.-J.1
  • 12
    • 17644425544 scopus 로고    scopus 로고
    • S. Linden et al., Science 306, 3531 (2004).
    • (2004) Science , vol.306 , pp. 3531
    • Linden, S.1
  • 24
    • 17644363625 scopus 로고    scopus 로고
    • note
    • In our estimation, an ideal mask was assumed to have perfect binary near-field profiles, but the actual intensity may be influenced by the material and geometries of the subwavelength mask near the superlens. Thus, Fig. 3 should be regarded as a general guideline to the performance of the real system. A more accurate description can be given by full vector electromagnetic simulations of the system, such as in (21).
  • 25
    • 17644363993 scopus 로고    scopus 로고
    • note
    • The image-recording conditions have been optimized to obtain the best possible image contrast in all experiments in this report. See the details of the control experiment in the supporting material on Science Online.
  • 27
    • 17644414426 scopus 로고    scopus 로고
    • note
    • To compute the image transfer function presented in Fig. 3, the dielectric constant (2.3013 + 0.0014i) of PMMA is taken from the 495PMMA product datasheet (Microchem), the refractive index (n = 1.6099) of NFR10SG is taken from JSR Micro, and a typical value of κ = 0.003 is taken into account for the absorption of the photoresist. In the computation, we assume that the photoresist occupies the top half of the space, whereas experimentally the actual photoresist layer thickness is 120 nm. The permittivity of silver (-2.4012 + 0.2488i) is taken from (32).
  • 29
    • 0037008494 scopus 로고    scopus 로고
    • H. J. Lezec et al., Science 297, 820 (2002).
    • (2002) Science , vol.297 , pp. 820
    • Lezec, H.J.1
  • 33
    • 17644424559 scopus 로고    scopus 로고
    • note
    • The authors acknowledge support from the Office of Naval Research (ONR)/Defense Advanced Research Projects Agency Multidisciplinary University Research Initiative (MURI) (ONR grant N00014-01-1-0803) and from NSF for the Center for Nanoscale Science and Engineering (grant DMI-0327077).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.