Numerical simulation of surface-plasmon-assisted nanolithography

Optics Express

Volumn 13, Issue 18, 2005, Pages 6964-6973

  Shao, D B ^a   Chen, S C ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MERCURY (METAL); NANOTECHNOLOGY; PHOTORESISTS; SILICON; SURFACE PLASMON RESONANCE; TITANIUM; ULTRAVIOLET RADIATION;

HIGH DENSITY NANOSCALE PATTERN; SILICON SUBSTRATE; SURFACE-PLASMON-ASSISTED NANOLITHOGRAPHY;

LITHOGRAPHY;

EID: 24944537591     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.006964     Document Type: Article

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