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Volumn 17, Issue 6, 1999, Pages 3262-3266

157 nm: Deepest deep-ultraviolet yet

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0033262709     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591137     Document Type: Article
Times cited : (65)

References (10)
  • 5
    • 26844547043 scopus 로고    scopus 로고
    • Litchfield, AZ, 15-17 February unpublished, organized by International SEMATECH
    • U. Stamm, presented at the 157 nm Lithography Workshop, Litchfield, AZ, 15-17 February 1999 (unpublished), organized by International SEMATECH.
    • (1999) 157 nm Lithography Workshop
    • Stamm, U.1
  • 6
    • 26844504850 scopus 로고    scopus 로고
    • Litchfield, AZ, 15-17 February unpublished, organized by International SEMATECH
    • T. Hoffman, J.-M Hueber, P. Das, and S. Scholler, presented at the 157 nm Lithography Workshop, Litchfield, AZ, 15-17 February 1999 (unpublished), organized by International SEMATECH.
    • (1999) 157 nm Lithography Workshop
    • Hoffman, T.1    Hueber, J.-M.2    Das, P.3    Scholler, S.4
  • 10
    • 0004040706 scopus 로고
    • edited by E. D. Palik Academic, San Diego
    • Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, San Diego, 1991), Vol. 2.
    • (1991) Handbook of Optical Constants of Solids , vol.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.