Evanescent interferometric lithography

Applied Optics

Volumn 40, Issue 10, 2001, Pages 1692-1698

  Blaikie, Richard J ^a   Mc Nab, Sharee J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; INTERFEROMETRY; LIGHT INTERFERENCE; LIGHTING; PHOTORESISTS; REFRACTIVE INDEX; RESONANCE;

EVANESCENT INTERFEROMETRIC LITHOGRAPHY (EIL);

PHOTOLITHOGRAPHY;

EID: 0001068049     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.001692     Document Type: Article

References (13)

1. S. Wegscheider, A. Kirsch, J. Mlynek, and G. Krausch, “Scanning near-field optical lithography,” Thin Solid Films 264, 264-267 (1995).
2. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, and D. R. S. Cumming, “Sub-diffraction-limited patterning using evanescent near field optical lithography,” Appl. Phys. Lett. 75, 3560-3562 (1999).
3. J. G. Goodberlet, “Patterning 100 nm features using deep-ultraviolet contact photolithography,” Appl. Phys. Lett. 76, 667-669 (2000).
4. E. Betzig, J. K. Trautman, R. Wolfe, E. M. Gyorgy, P. L. Finn, M. H. Kryder, and C.-H. Chang, “Near-field magneto-optics and high density data storage,” Appl. Phys. Lett. 61, 142-144 (1992).
5. P. E. Dyer, R. J. Farley, and R. Giedl, “Analysis of grating formation with excimer laser irradiated phase masks,” Opt. Commun. 115, 327-334 (1995).
6. D. S. Hobbs, B. D. MacLeod, A. F. Kelsey, M. A. Leclerc, E. Sabatino, and D. P. Resler, “Automated interference lithography systems for generation of sub-micron feature size patterns,” in Micromachine Technology for Diffractive and Holographic Optics, S. H. Lee and J. A. Cox, eds., Proc. SPIE 3879, 124-135 (1999).
7. D. M. Tennant, K. F. Dreyer, K. Feder, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, C. Vartuli, and M. G. Young, “Advances in near field holographic grating mask technology,” J. Vac. Sci. Technol. B 12, 3689-3694 (1994).
8. W. H. Yeh, M. Mansuripur, M. Fallahi, and R. S. Penner, “Talbot imaging with increased spatial frequency: a technique for replicating truncated self-imaging objects,” Opt. Commun. 170, 207-212 (1999).
9. C. H. Hafner, “Post-modern electromagnetics using intelligent Maxwell solvers,” (Wiley, Chichister, UK, 1998).
10. D. R. Lide, ed., CRC Handbook of Chemistry and Physics, 75th ed. (CRC Press, Cleveland, Ohio, 1994).
11. S. J. McNab and R. J. Blaikie, “Investigating the fundamental limit to resolution in the evanescent near field,” in Proceedings of Image and Vision Computing New Zealand 1999 (ICVNZ99), D. Pairman and H. North, eds. (Landcare Research Ltd., Lincoln, New Zealand, 1999), pp. 97-102.
12. W. M. Moreau, Semiconductor Lithography: Principles, Practices, and Materials (Plenum, New York, 1988), pp. 373-376.
13. E. G. Loewen and E. Popov, Diffraction Gratings and Applications (Marcel Dekker, New York, 1997), pp. 28-30.