Spectroscopic ellipsometry and x-ray photoelectron spectroscopy of La 2O3 thin films deposited by reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 2, 2011, Pages

  Atuchin, V V ^a   Kalinkin, A V ^b   Kochubey, V A ^a   Kruchinin, V N ^c   Vemuri, R S ^d   Ramana, C V ^d  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

^c INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^d 500 W University Avenue   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STATE; DISPERSION OF REFRACTIVE INDEX; OPTICAL ABSORPTION; OPTICAL PARAMETER; REACTIVE DC MAGNETRON SPUTTERING; REACTIVE GAS; REACTIVE MAGNETRON SPUTTERING; SI SUBSTRATES; SPECTRAL RANGE; SUBSTRATE TEMPERATURE; SURFACE LAYERS;

CHEMICAL ANALYSIS; LANTHANUM OXIDES; OPTICAL VARIABLES CONTROL; PHOTOELECTRICITY; PHOTONS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79952409714     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3539069     Document Type: Article

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