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Volumn 106, Issue 12, 2009, Pages

Comprehensive x-ray photoelectron spectroscopy study on compositional gradient lanthanum silicate film

(11) Kakushima, K a Tachi, K a Song, J a Sato, S a Nohira, H b Ikenaga, E c Ahmet, P a Tsutsui, K a Sugii, N a Hattori, T a Iwai, H a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

b TOKYO CITY UNIVERSITY (Japan)

c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; AS-DEPOSITED STATE; BINDING ENERGY SHIFTS; BRIDGING OXYGEN; COMPOSITION RATIO; COMPOSITIONAL GRADIENTS; HIGH-TEMPERATURE ANNEALING; IN-SITU; INTERFACE REACTIONS; LANTHANUM SILICATES; NON-BRIDGING OXYGEN; NON-BRIDGING OXYGEN ATOMS; OXYGEN BONDING; PT ELECTRODE; ROUGH ESTIMATION; SILICATE FILM; SILICATE LAYERS; TEMPERATURE DEPENDENCE; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

ANNEALING; ATOMS; BINDING ENERGY; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PLATINUM; SILICATES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 73849102452 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3269705 Document Type: Article

Times cited : (21)

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