SCOPUS 정보 검색 플랫폼

Optics and Spectroscopy (English translation of Optika i Spektroskopiya)

Volumn 106, Issue 1, 2009, Pages 72-77

Optical properties of the HfO2 - X N x and TiO 2 - X N x films prepared by ion beam sputtering

(7) Atuchin, V V a Kruchinin, V N a Kalinkin, A V b Aliev, V Sh b Rykhlitskii, S V b Shvets, V A b Spesivtsev, E V b

a BORESKOV INSTITUTE OF CATALYSIS (Russian Federation)

b INSTITUTE OF SEMICONDUCTOR PHYSICS (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM COMPOUNDS; ION BEAMS; NITRIDES; NITROGEN; OPTICAL PROPERTIES; PHOTOELECTRON SPECTROSCOPY; SPUTTERING; TITANIUM; TITANIUM COMPOUNDS; TITANIUM DIOXIDE; TITANIUM NITRIDE;

CHEMICAL COMPOSITIONS; DISPERSION RELATIONS; ION-BEAM SPUTTERING; NITROGEN CONTENTS; OPTICAL CHARACTERISTICS; OPTICAL PARAMETERS; OXYNITRIDE FILMS; REACTIVE ION BEAM SPUTTERING; SPECTRAL ELLIPSOMETRIES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 59749086339 PISSN: 0030400X EISSN: 15626911 Source Type: Journal
DOI: 10.1134/S0030400X09010093 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.