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Volumn 98, Issue 5, 2011, Pages

A versatile microelectromechanical system for nanomechanical testing

Author keywords

[No Author keywords available]

Indexed keywords

ACCURACY AND PRECISION; CRITICAL PROPERTIES; ELECTRONIC MEASUREMENTS; EX SITU; IN-SITU; MAGNIFICATION IMAGES; MATERIAL TESTING; MEMSDEVICES; MICRO ELECTRO MECHANICAL SYSTEM; MICROELECTROMECHANICAL SYSTEMS; MODE OF OPERATIONS; NANO-CRYSTALLINE NICKEL; NANO-MATERIALS; NANOMECHANICAL TESTING; NANOMECHANICAL TESTS; UNIAXIAL TENSILE TEST;

EID: 79951478228     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3553195     Document Type: Article
Times cited : (36)

References (33)
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    • The MEMS used in Ref. can be used inside a SEM; however, the sensing technique would not allow continuous imaging of the specimen.
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    • A was calculated based on an analytical formula given in Ref..
    • A was calculated based on an analytical formula given in Ref..
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    • Based on X-ray diffraction data not shown here, our nc Ni is slightly more textured [in the (111) direction] compared to Ref. [intensity ratio between (200) and (111) is ∼0.15 for our nc Ni, while it is ∼0.4 for Ref.].
    • Based on X-ray diffraction data not shown here, our nc Ni is slightly more textured [in the (111) direction] compared to Ref. [intensity ratio between (200) and (111) is ∼0.15 for our nc Ni, while it is ∼0.4 for Ref.].
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    • Error bars in displacement measurements from 15 to 25 nm
    • Error bars in displacement measurements from 15 to 25 nm.
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    • f =19 fF; however, this did not affect the stress-strain curve measurement since optical calibration was also performed.
    • f =19 fF; however, this did not affect the stress-strain curve measurement since optical calibration was also performed.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.