In situ tensile testing of individual Co nanowires inside a scanning electron microscope

Nanotechnology

Volumn 20, Issue 36, 2009, Pages

  Zhang, Dongfeng ^a,b   Breguet, Jean Marc ^a   Clavel, Reymond ^a   Phillippe, Laetitia ^b   Utke, Ivo ^b   Michler, Johann ^b  

^a EPFL   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM STRUCTURES; BULK MODULUS; CLAMPED-CLAMPED BEAM; CO NANOWIRES; COMB-DRIVE ACTUATOR; ELECTROCHEMICAL DEPOSITION PROCESS; EXPERIMENTAL MEASUREMENTS; FOCUSED ION BEAM INDUCED DEPOSITION; FORCE SENSOR; HIGH YIELD; IN-SITU; IN-SITU TENSILE TESTING; MICROFABRICATED; MONOCRYSTALLINE; NANO SCALE; NANOCRYSTALLINE CO; NANOMANIPULATIONS; NOVEL STRATEGIES; PICK-AND-PLACE; POROUS TEMPLATES; QUASI-STATIC; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRON MICROSCOPES; SEM; SEM IMAGE; TENSILE FORCES; THEORETICAL STRENGTH; YOUNG'S MODULUS;

ELASTIC MODULI; ELECTRIC WIRE; ELECTRON MICROSCOPES; MATERIALS TESTING APPARATUS; NANOTECHNOLOGY; NANOWIRES; REDUCTION; SCANNING ELECTRON MICROSCOPY; SPECIMEN PREPARATION; TENSILE STRENGTH; UNCERTAINTY ANALYSIS;

TENSILE TESTING;

COPPER; NANOWIRE;

ARTICLE; CONTROLLED STUDY; FIELD EMISSION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TENSILE STRENGTH; YOUNG MODULUS;

EID: 70349151391     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/36/365706     Document Type: Article

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