SCOPUS 정보 검색 플랫폼

Volumn 257, Issue 7, 2011, Pages 3075-3080

Thickness dependent physical and photocatalytic properties of ITO thin films prepared by reactive DC magnetron sputtering

(3) Kumar, K Jagadeesh a Raju, N Ravi Chandra a Subrahmanyam, A a

a INDIAN INSTITUTE OF TECHNOLOGY MADRAS (India)

Author keywords

ITO thin films; Magnetron sputtering; Photocatalysis; Thickness; Work function

Indexed keywords

AMORPHOUS FILMS; CARRIER CONCENTRATION; CONDUCTIVE FILMS; ENERGY GAP; HALL MOBILITY; INDIUM COMPOUNDS; ITO GLASS; MAGNETRON SPUTTERING; PHOTOCATALYSIS; PROBES; REFRACTIVE INDEX; SUBSTRATES; TIN OXIDES; WORK FUNCTION;

DEGRADATION OF ORGANIC COMPOUNDS; INDIUM TIN OXIDE THIN FILMS; ITO THIN FILMS; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC MATERIALS; PREFERENTIAL ORIENTATION; REACTIVE DC MAGNETRON SPUTTERING; THICKNESS;

THIN FILMS;

EID: 79251595179 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.10.119 Document Type: Article

Times cited : (87)

References (42)

1
- 0032606580
- H. Kim, A. Pique, J.S. Horwitz, H. Mattoussi, H. Murata, Z.H. Kafafi, and D.B. Chrisey Appl. Phys. Lett. 74 1999 3444 3446
- (1999) Appl. Phys. Lett. , vol.74 , pp. 3444-3446
- Kim, H.¹ Pique, A.² Horwitz, J.S.³ Mattoussi, H.⁴ Murata, H.⁵ Kafafi, Z.H.⁶ Chrisey, D.B.⁷

2
- 0037011145
- V. Teixeira, H.N. Cui, L.J. Meng, E. Fortunato, and R. Martins Thin Solid Films 420 2002 70 75
- (2002) Thin Solid Films , vol.420 , pp. 70-75
- Teixeira, V.¹ Cui, H.N.² Meng, L.J.³ Fortunato, E.⁴ Martins, R.⁵

3
- 55649100709
- J.B. Chu, S.M. Huang, H.B. Zhu, X.B. Xu, Z. Sun, Y.W. Chen, and F.Q. Huang J. Non-Cryst. Solids 354 2008 5480 5484
- (2008) J. Non-Cryst. Solids , vol.354 , pp. 5480-5484
- Chu, J.B.¹ Huang, S.M.² Zhu, H.B.³ Xu, X.B.⁴ Sun, Z.⁵ Chen, Y.W.⁶ Huang, F.Q.⁷

4
- 0030195582
- H.P. Lobl, M. Huppertz, and D. Mergel Surf. Coat. Technol. 82 1996 90 98
- (1996) Surf. Coat. Technol. , vol.82 , pp. 90-98
- Lobl, H.P.¹ Huppertz, M.² Mergel, D.³

5
- 0035387324
- T. Sako, A. Ohmi, H. Yumoto, and K. Nishiyama Surf. Coat. Technol. 142/144 2001 781 785
- (2001) Surf. Coat. Technol. , vol.142-144 , pp. 781-785
- Sako, T.¹ Ohmi, A.² Yumoto, H.³ Nishiyama, K.⁴

6
- 0033873061
- J.W. Bae, H.J. Kim, J.S. Kim, N.E. Lee, and G.Y. Yeom Vacuum 56 2000 77 81
- (2000) Vacuum , vol.56 , pp. 77-81
- Bae, J.W.¹ Kim, H.J.² Kim, J.S.³ Lee, N.E.⁴ Yeom, G.Y.⁵

7
- 0034249780
- E. Terzini, P. Thilakan, and C. Minarini Mater. Sci. Eng. B 77 2000 110 114
- (2000) Mater. Sci. Eng. B , vol.77 , pp. 110-114
- Terzini, E.¹ Thilakan, P.² Minarini, C.³

8
- 54049126528
- X.D. Liu, E.Y. Jiang, and D.X. Zhang J. Appl. Phys. 104 2008 073711 (5pp)
- (2008) J. Appl. Phys. , vol.104
- Liu, X.D.¹ Jiang, E.Y.² Zhang, D.X.³

9
- 0142217256
- H.C. Lee, J.Y. Seo, Y.W. Choi, and D.W. Lee Vacuum 72 2004 269 276
- (2004) Vacuum , vol.72 , pp. 269-276
- Lee, H.C.¹ Seo, J.Y.² Choi, Y.W.³ Lee, D.W.⁴

10
- 10844267338
- J.O. Park, J.H. Lee, J.J. Kim, S.H. Cho, and Y.K. Cho Thin Solid Films 474 2005 127 132
- (2005) Thin Solid Films , vol.474 , pp. 127-132
- Park, J.O.¹ Lee, J.H.² Kim, J.J.³ Cho, S.H.⁴ Cho, Y.K.⁵

11
- 33646570268
- J.H. Kim, K.A. Jeon, G.H. Kim, and S.Y. Lee Appl. Surf. Sci. 252 2006 4834 4837
- (2006) Appl. Surf. Sci. , vol.252 , pp. 4834-4837
- Kim, J.H.¹ Jeon, K.A.² Kim, G.H.³ Lee, S.Y.⁴

12
- 0034517397
- D. Kim, Y. Han, J.S. Cho, and S.K. Koh Thin Solid Films 377/378 2000 81 86
- (2000) Thin Solid Films , vol.377-378 , pp. 81-86
- Kim, D.¹ Han, Y.² Cho, J.S.³ Koh, S.K.⁴

13
- 0033882385
- A. Amaral, P. Brogueira, and C.N. de Carvalho Surf. Coat. Technol. 125 2000 151 156
- (2000) Surf. Coat. Technol. , vol.125 , pp. 151-156
- Amaral, A.¹ Brogueira, P.² De Carvalho, C.N.³

14
- 2542454125
- A. El Hichou, A. Kachouane, J.L. Bubendorff, M. Addou, J. Ebothe, M. Troyon, and A. Bougrine Thin Solid Films 458 2004 263 268
- (2004) Thin Solid Films , vol.458 , pp. 263-268
- El Hichou, A.¹ Kachouane, A.² Bubendorff, J.L.³ Addou, M.⁴ Ebothe, J.⁵ Troyon, M.⁶ Bougrine, A.⁷

15
- 0036837176
- Y.C. Park, Y.S. Kim, H.K. Seo, S.G. Ansari, and H.S. Shin Surf. Coat. Technol. 161 2000 62 69
- (2000) Surf. Coat. Technol. , vol.161 , pp. 62-69
- Park, Y.C.¹ Kim, Y.S.² Seo, H.K.³ Ansari, S.G.⁴ Shin, H.S.⁵

16
- 34247225549
- C. Guillen, and J. Herrero J. Appl. Phys. 101 2007 073514 (7pp)
- (2007) J. Appl. Phys. , vol.101
- Guillen, C.¹ Herrero, J.²

17
- 34247097777
- C.G. Choi, K. No, W.J. Lee, H.G. Kim, S.O. Jung, W.J. Lee, W.S. Kim, S.J. Kim, and C. Yoon Thin Solid Films 258 1995 274 278
- (1995) Thin Solid Films , vol.258 , pp. 274-278
- Choi, C.G.¹ No, K.² Lee, W.J.³ Kim, H.G.⁴ Jung, S.O.⁵ Lee, W.J.⁶ Kim, W.S.⁷ Kim, S.J.⁸ Yoon, C.⁹

18
- 72049119859
- L. Kerkache, A. Layadi, and A. Mosser J. Alloys Compd. 485 2009 46 50
- (2009) J. Alloys Compd. , vol.485 , pp. 46-50
- Kerkache, L.¹ Layadi, A.² Mosser, A.³

19
- 0029256376
- C.H. Yi, Y. Shigesato, I. Yasui, and S. Takaki Jpn. J. Appl. Phys. 34 1995 L244 L247
- (1995) Jpn. J. Appl. Phys. , vol.34
- Yi, C.H.¹ Shigesato, Y.² Yasui, I.³ Takaki, S.⁴

20
- 4544323062
- Z. Qiao, R. Latz, and D. Mergel Thin solid films 466 2004 250 258
- (2004) Thin Solid Films , vol.466 , pp. 250-258
- Qiao, Z.¹ Latz, R.² Mergel, D.³

21
- 43049115788
- M.Z. Gao, R. Job, D.S. Xue, and W.R. Fahrner Chin. Phys. Lett. 25 2008 1380 1383
- (2008) Chin. Phys. Lett. , vol.25 , pp. 1380-1383
- Gao, M.Z.¹ Job, R.² Xue, D.S.³ Fahrner, W.R.⁴

22
- 39749185407
- L. Hao, X. Diao, H. Xu, B. Gu, and T. Wang Appl. Surf. Sci. 254 2008 3504 3508
- (2008) Appl. Surf. Sci. , vol.254 , pp. 3504-3508
- Hao, L.¹ Diao, X.² Xu, H.³ Gu, B.⁴ Wang, T.⁵

23
- 47749085520
- C. Guillen, and J. Herrero Semicond. Sci. Technol. 23 2008 075002 (5pp)
- (2008) Semicond. Sci. Technol. , vol.23
- Guillen, C.¹ Herrero, J.²

24
- 33845413267
- D.H. Kim, M.R. Park, H.J. Lee, and G.H. Lee Appl. Surf. Sci. 253 2006 409 411
- (2006) Appl. Surf. Sci. , vol.253 , pp. 409-411
- Kim, D.H.¹ Park, M.R.² Lee, H.J.³ Lee, G.H.⁴

25
- 0001350492
- H. Kim, J.S. Horwitz, G. Kushto, A. Pique, Z.H. Kafafi, C.M. Gilmore, and D.B. Chrisey J. Appl. Phys. 88 2000 6021 6025
- (2000) J. Appl. Phys. , vol.88 , pp. 6021-6025
- Kim, H.¹ Horwitz, J.S.² Kushto, G.³ Pique, A.⁴ Kafafi, Z.H.⁵ Gilmore, C.M.⁶ Chrisey, D.B.⁷

26
- 0037442708
- C. Liu, T. Matsutani, T. Asanuma, K. Murai, M. Kiuchi, E. Alves, and M. Reis J. Appl. Phys. 93 2003 2262 2266
- (2003) J. Appl. Phys. , vol.93 , pp. 2262-2266
- Liu, C.¹ Matsutani, T.² Asanuma, T.³ Murai, K.⁴ Kiuchi, M.⁵ Alves, E.⁶ Reis, M.⁷

27
- 0031269514
- J. Sheng, J. Karasawa, and T. Fukami J. Mater. Sci. Lett. 16 1997 1709 1711
- (1997) J. Mater. Sci. Lett. , vol.16 , pp. 1709-1711
- Sheng, J.¹ Karasawa, J.² Fukami, T.³

28
- 0034115629
- D. Chen, F. Li, and A.K. Ray AIChE J. 46 2000 1034 1045
- (2000) AIChE J. , vol.46 , pp. 1034-1045
- Chen, D.¹ Li, F.² Ray, A.K.³

29
- 84863397707
- CRC Press Florida
- A. Subrahmanyam, and C. Suresh Kumar Kelvin Probe for Surface Engineering 2009 CRC Press Florida
- (2009) Kelvin Probe for Surface Engineering
- Subrahmanyam, A.¹ Suresh Kumar, C.²

30
- 0003427458
- 2nd ed. Additson-Wesley Reading, MA
- B.D. Cullity Elements of X-ray Diffraction 2nd ed. 1978 Additson-Wesley Reading, MA
- (1978) Elements of X-ray Diffraction
- Cullity, B.D.¹

31
- 0003072653
- W. Heitmann Thin Solid Films 5 1970 61 67
- (1970) Thin Solid Films , vol.5 , pp. 61-67
- Heitmann, W.¹

32
- 52649176750
- J.K. Kim, C. Sameer, M.F. Schubert, E.F. Schubert, A.J. Fischer, M.H. Crawford, J. Cho, H. Kim, and C. Sone Adv. Mater. 20 2008 801 804
- (2008) Adv. Mater. , vol.20 , pp. 801-804
- Kim, J.K.¹ Sameer, C.² Schubert, M.F.³ Schubert, E.F.⁴ Fischer, A.J.⁵ Crawford, M.H.⁶ Cho, J.⁷ Kim, H.⁸ Sone, C.⁹

33
- 0000732689
- H. Kim, and J.S. Horwitz Appl. Phys. Lett. 78 2001 1050 1052
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1050-1052
- Kim, H.¹ Horwitz, J.S.²

34
- 0013141867
- Y. Shigesato, S. Takaki, and T. Haranou Appl. Surf. Sci. 48/49 1991 269 275
- (1991) Appl. Surf. Sci. , vol.4849 , pp. 269-275
- Shigesato, Y.¹ Takaki, S.² Haranou, T.³

35
- 0027666759
- P. Manivannan, and A. Subrahmanyam J. Phys. D: Appl. Phys. 26 1993 1510 1515
- (1993) J. Phys. D: Appl. Phys. , vol.26 , pp. 1510-1515
- Manivannan, P.¹ Subrahmanyam, A.²

36
- 3042687357
- H.J. Nam, T. Amemiya, M. Murabayashi, and K. Itho J. Phys. Chem. B 108 2004 8254 8259
- (2004) J. Phys. Chem. B , vol.108 , pp. 8254-8259
- Nam, H.J.¹ Amemiya, T.² Murabayashi, M.³ Itho, K.⁴

37
- 57849151924
- R. Pan, S. Pan, J. Zhou, and Y. Wu Appl. Surf. Sci. 255 2009 3642 3647
- (2009) Appl. Surf. Sci. , vol.255 , pp. 3642-3647
- Pan, R.¹ Pan, S.² Zhou, J.³ Wu, Y.⁴

38
- 0003636049
- Marcel Dekker Inc New York
- A. Wieckowski, Interfacial Electrochemistry: Theory, Experiment and Applications 1999 Marcel Dekker Inc New York
- (1999) Interfacial Electrochemistry: Theory, Experiment and Applications
- Wieckowski, A.¹

39
- 0343249691
- N.S. Lewis Annu. Rev. Phys. Chem. 42 1991 543 580
- (1991) Annu. Rev. Phys. Chem. , vol.42 , pp. 543-580
- Lewis, N.S.¹

40
- 0021420007
- S. Hinckley, and D. Haneman Appl. Surf. Sci. 22/23 1985 1075 1082
- (1985) Appl. Surf. Sci. , vol.2223 , pp. 1075-1082
- Hinckley, S.¹ Haneman, D.²

41
- 79952637268
- P. Ruankham, C.S. Kung, N. Mangkorntong, P. Mangkorntong, and S. Choopun CMU. J. Nat. Sci. 7 1 2008 177 183
- (2008) CMU. J. Nat. Sci. , vol.7 , Issue.1 , pp. 177-183
- Ruankham, P.¹ Kung, C.S.² Mangkorntong, N.³ Mangkorntong, P.⁴ Choopun, S.⁵

42
- 34250162078
- W. Lee, R.S. Mane, S.H. Lee, and S.H. Han Electrochem. Commun. 9 2007 1502 1507
- (2007) Electrochem. Commun. , vol.9 , pp. 1502-1507
- Lee, W.¹ Mane, R.S.² Lee, S.H.³ Han, S.H.⁴

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