Thickness dependence of resistivity and optical reflectance of ITO films

Chinese Physics Letters

Volumn 25, Issue 4, 2008, Pages 1380-1383

  Gao, Mei Zhen ^a,b   Job, R ^b   Xue, De Sheng ^a   Fahrner, W R ^b  

^a LANZHOU UNIVERSITY   (China)

^b UNIVERSITY OF HAGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INDIUM COMPOUNDS; ITO GLASS; SILICON WAFERS; TIN OXIDES;

CORNING GLASS; CRYSTALLINE SILICON WAFERS; DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT-CURRENT MAGNETRON SPUTTERING; FILM-THICKNESS; INDIUM TIN OXIDE FILMS; MAGNETRON SPUTTERING METHOD; OPTICAL REFLECTANCE; STRUCTURE RESISTANCE; THICKNESS DEPENDENCE;

REFLECTION;

EID: 43049115788     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/25/4/059     Document Type: Article

References (13)