Effects of oxygen ion beam plasma conditions on the properties of indium tin oxide thin films

Vacuum

Volumn 56, Issue 1, 2000, Pages 77-81

  Bae, J W ^a   Kim, H J ^a   Kim, J S ^a   Lee, N E ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Evaporation; ITO; Oxygen ion beam

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; EVAPORATION; FLOW CONTROL; ION BEAMS; LIGHT TRANSMISSION; SEMICONDUCTING FILMS; SEMICONDUCTING INDIUM COMPOUNDS; THIN FILMS; VOLTAGE CONTROL;

INDIUM TIN OXIDE;

BEAM PLASMA INTERACTIONS;

EID: 0033873061     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00169-4     Document Type: Article

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