Influence of the film thickness on the structure, optical and electrical properties of ITO coatings deposited by sputtering at room temperature on glass and plastic substrates

Semiconductor Science and Technology

Volumn 23, Issue 7, 2008, Pages

  Guillen C ^a   Herrero, J ^a  

^a CIEMAT   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BIOACTIVITY; CARRIER COMMUNICATION; CIVIL AVIATION; CLADDING (COATING); CONCENTRATION (PROCESS); CONDUCTIVE FILMS; CRYSTALLITE SIZE; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; GLASS; HEALTH; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; OPTICAL GLASS; OXIDE FILMS; PLASTIC BOTTLES; PLASTIC COATINGS; POSITRON ANNIHILATION SPECTROSCOPY; POSITRON EMISSION TOMOGRAPHY; SUBSTRATES; THERMOPLASTICS; THICKNESS MEASUREMENT; TIN; TITANIUM COMPOUNDS;

CARRIER (CO); COATING THICKNESSES; CONCENTRATION (COMPOSITION); FREE-CARRIER CONCENTRATION (FCC); INDIUM TIN OXIDE (ITO) FILMS; LATTICE DISTORTIONS; NEAR INFRA RED (NIR) REGION; OPTICAL AND ELECTRICAL PROPERTIES; PLASTIC SUBSTRATES; POLY CRYSTALLINE; POLYETHYLENE TEREPHTHALATE (PET); ROOM-TEMPERATURE (RT);

CARRIER CONCENTRATION;

EID: 47749085520     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/23/7/075002     Document Type: Article

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