Effect of film thickness on the properties of indium tin oxide thin films

Journal of Applied Physics

Volumn 88, Issue 10, 2000, Pages 6021-6025

  Kim, H ^a,b   Horwitz, J S ^a   Kushto, G ^a   Pique A ^a   Kafafi, Z H ^a   Gilmore, C M ^a,b   Chrisey, D B ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b George Washington University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001350492     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1318368     Document Type: Article

References (24)

1. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films (Institute of Physics, Philadelphia, 1995).
2. C. W. Tang and S. A. Van Slyke, Appl. Phys. Lett. 51, 913 (1987).
3. H. Kim, A. Piqué, J. S. Horwitz, H. Mattoussi, H. Murata, Z. H. Kafafi, and D. B. Chrisey, Appl. Phys. Lett. 74, 3444 (1999).
4. M. Buchanan, J. B. Webb, and D. F. Williams, Appl. Phys. Lett. 37, 213 (1980).
5. R. P. Howson and H. A. Jafar, J. Vac. Sci. Technol. A 10, 1784 (1992).
6. T. Karasawa and Y. Miyata, Thin Solid Films 223, 135 (1993).
7. T. Maruyama and K. Fukui, Thin Solid Films 203, 297 (1991).
8. T. Maruyama and K. Fukui, J. Appl. Phys. 70, 3848 (1991).
9. V. Vasu and A. Subrahmanyam, Thin Solid Films 193/194, 696 (1990).
10. S. Kulaszewicz, W. Jarmoc, and K. Turowska, Thin Solid Films 112, 313 (1984).
11. H. Kim, C. M. Gilmore, A. Piqué, J. S. Horwitz, H. Mattoussi, H. Murata, Z. H. Kafafi, and D. B. Chrisey, J. Appl. Phys. 86, 6451 (1999).
12. D. B. Chrisey and G. K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994).
13. D. K. Schroder, Semiconductor Material and Device Characterization (Wiley, New York, 1990).
14. B. D. Cullity, Elements of X-ray Diffraction, 2nd ed. (Additson-Wesley, Reading, MA, 1978).
15. H. Murata, C. D. Merritt, and Z. H. Kafafi, IEEE J. Sel. Top. Quantum Electron. 4, 119 (1998).
16. Y. Sadaoka, T. A. Jones, W. Gopel, S. Kimura, and N. Honda, J. Mater. Sci. 25, 2632 (1990).
17. E. Bertran, J. L. Morenza, and M. Varela, Thin Solid Films 129, 103 (1985).
18. JCPDS Card No. 06-0416.
19. J. Ye and K. Nakamura, Phys. Rev. B 48, 7554 (1993).
20. S. Shin, Mater. Res. Bull. 16, 299 (1981).
21. W.-F. Wu and B.-S. Chiou, Thin Solid Films 293, 244 (1997).
22. J. L. Vossen, Phys. Thin Films 9, 1 (1977).
23. E. Burstein, Phys. Rev. 93, 632 (1954).
24. T. S. Moss, Proc. Phys. Soc. London, Sect. B 67, 775 (1954).