Room-temperature growth of crystalline indium tin oxide films on glass using low-energy oxygen-ion-beam assisted deposition

Journal of Applied Physics

Volumn 93, Issue 4, 2003, Pages 2262-2266

  Liu, C ^a,b   Matsutani, T ^a   Asanuma, T ^a   Murai, K ^a   Kiuchi, M ^a   Alves, E ^c   Reis, M ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b WUHAN UNIVERSITY   (China)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; ION BEAM ASSISTED DEPOSITION; LIGHT TRANSMISSION; SURFACE ROUGHNESS; X RAY DIFFRACTION;

OXYGEN-ION-BEAM ASSISTED DEPOSITION;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0037442708     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1538335     Document Type: Article

References (28)

1. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films 102, 1 (1983).
2. S. A. Carter, M. Angelopoulos, S. Karg, P. J. Brock, and J. C. Scott, Appl. Phys. Lett. 70, 2067 (1997).
3. B. H. Lee, I. G. Kim, S. W. Cho, and S. Lee, Thin Solid Films 302, 25 (1997).
4. L. Meng and M. P. dos Santos, Thin Solid Films 322, 56 (1998).
5. D. Kim, Y. Han, J. Cho, and S. Koh, Thin Solid Films 377-378, 81 (2000).
6. H.-U. Habermeier, Thin Solid Films 80, 157 (1980).
7. J. E. Morris, M. I. Ridge, C. A. Bishop, and R. P. Howson, J. Appl. Phys. 51, 1847 (1980).
8. H. Dislich, J. Non-Cryst. Solids 57, 371 (1988).
9. J. P. Zheng and H. S. Kwok, Appl. Phys. Lett. 63, 1 (1993).
10. C. Yuanri and X. Xinghao, Thin Solid Films 115, 195 (1984).
11. C. Coutal, A. Azéma, and J.-C. Roustan, Thin Solid Films 288, 248 (1996).
12. H.-J. Krokoszinski and R. Oesterlein, Thin Solid Films 187, 179 (1990).
13. F. Zhu, C. H. A. Huan, K. Zhang, and A. T. S. Wee, Thin Solid Films 359, 244 (2000).
14. H. Morikawa and M. Fujita, Thin Solid Films 359, 61 (2000).
15. C. T. Lee, Q. X. Yu, B. T. Tang, and H. Y. Lee, Thin Solid Films 386, 105 (2001).
16. J. Cho, K. H. Yoon, and S. Koh, Thin Solid Films 368, 111 (2000).
17. J. W. Bae, J. S. Kim, and G. Y. Yeom, Nucl. Instrum. Methods Phys. Res. B 178, 311 (2001).
18. K. Zhang, F. Zhu, C. H. A. Huan, and A. T. S. Wee, Thin Solid Films 376, 255 (2000).
19. S. Laux, N. Kaiser, A. Zöller, R. Götzelmann, H. Lauth, and H. Bernitzki, Thin Solid Films 335, 1 (1998).
20. X. W, Sun, H. C. Huang, and H. S. Kwok, Appl. Phys. Lett. 68, 2663 (1996).
21. H. Morikawa, H. Sumi, and M. Kohyama, Thin Solid Films 281-282, 202 (1996).
22. J. W. Bae, H. J. Kim, J. S. Kim, N. E. Lee, and G. Y. Yeom, Vacuum 56, 77 (2000).
23. H. Izumi, F. O. Adurodija, T. Kaneyoshi, T. Ishihara, H. Yoshioka, and M. Motoyama, J. Appl. Phys. 91, 1213 (2002).
24. G. Frank and H. Köstlin, Appl. Phys. A: Solids Surf. 27, 197 (1982).
25. C. N. Carvalho, A. M. B. Rego, A. Amaral, P. Brogueira, and G. Lavareda, Surf. Coat. Technol. 124, 70 (2000).
26. H. Kim, J. S. Horwitz, G. Kushto, A. Piqué, Z. H. Kafali, C. M. Gilmore, and D. B. Chrisey, J. Appl. Phys. 88, 6021 (2000).
27. J. S. Kim, J. W. Bae, H. J. Kim, N. E. Lee, G. Y. Yeom, and K. H. Oh, Thin Solid Films 377-378, 103 (2000).
28. H. Izumi, T. Ishihara, H. Yoshioka, H. Matsui, and M. Motoyama, 45th Spring Meeting of the Japan Society of Applied Physics and Related Societies, Tokyo, March 28-31, 1998, Vol. 2, p. 636.