Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 46-50

  Kerkache, L ^a   Layadi, A ^a   Mosser, A ^b  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

ITO thin films; Optical properties; Sputtering; Structure

Indexed keywords

CHEMICAL COMPOSITIONS; CRYSTALLINE STRUCTURE; DC DIODE SPUTTERING; EFFECT OF OXYGEN; ENERGY GAP VALUES; GLASS SUBSTRATES; GRAIN SIZE; ITO FILMS; ITO THIN FILMS; OPTICAL TRANSMISSIONS; PARTIAL PRESSURE OF OXYGEN; PREFERRED ORIENTATIONS; SEM; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; TIN DOPED INDIUM OXIDE; VISIBLE REGION; X RAY PHOTOEMISSION SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; EMISSION SPECTROSCOPY; INDIUM COMPOUNDS; LIGHT TRANSMISSION; ORGANIC POLYMERS; OXYGEN; PRESSURE EFFECTS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STRUCTURAL PROPERTIES; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; TIN;

OPTICAL FILMS;

EID: 72049119859     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.06.103     Document Type: Article

References (28)

1. Kim Y.S., Park Y., Ansari S.G., Lee J.Y., Lee B., and Shin H. Surf. Coat. Technol. 173 (2003) 299
2. Seng J., Kim Y., and Kang Y. Curr. Appl. Phys. 6 (2006) 791
3. Löbl H.P., Huppertz M., and Mergel D. Surf. Coat. Technol. 82 (1996) 90
4. Zimmermann B., Glatthaar M., Niggermann M., Riede M.K., Hinsch A., and Gombert A. Sol. Energy Mater. Sol. Cells 91 (2007) 374
5. Vaufrey D., Benkhalifa M., Besland M.-P., Tardy J., Sandu C., Blanchin M.-G., and Roger J.-A. Mater. Sci. Eng. C 21 (2002) 265
6. Bornand V., and Papet Ph. Mater. Chem. Phys. 92 (2005) 424
7. Bwiven X., Yafeng S., Meng M., and Chuannan L. Microelectron. J. 36 (2005) 105
8. Kobayashi H., Ishida T., Nakamura K., Nakato Y., and Tsubomura H. J. Appl. Phys. 72 (1992) 5288
9. Hamberg I., and Granqvist C.G. J. Appl. Phys. 60 11 (1986) R123
10. Shigesato Y., Hayashi Y., Masui A., and Haranou T. Jpn. J. Appl. Phys. 30 (1991) 814
11. Guittoum A., Kerkache L., and Layadi A. Euro. Phys. J.: Appl. Phys. 7 (1999) 201
12. Cruz L.R., Legnani C., Matoso I.G., Ferreira C.L., and Moutinho H.R. Mater. Res. Bull. 39 (2004) 993
13. Kerkache L., Layadi A., Dogheche E., and Remiens D. J. Phys. D: Appl. Phys. 39 (2006) 184-189
14. Manoj P.K., Joseph B., Vaidyan V.K., and Sumangala Devi Amma D. Ceram. Int. 33 (2007) 273
15. Stoica T.F., Teodorescu V.S., Blanchin M.G., Gortner M., Losurdo M., and Zaharescu M. Mater. Sci. Eng. B101 (2003) 222
16. Valencia H.Y., Moreno L.C., and Ardilla A.M. Microelectron. J. 39 (2008) 1356
17. Ngaffo F., Caricato A., Fazzi A., Fernandez M., Lattante S., Martino M., and Romano F. Appl. Surf. Sci. 248 (2005) 428
18. Kerkache L., Sadaoui K., and Layadi A. Euro. Phys. J.: Appl. Phys. 1 2 (1998) 177-180
19. Kerkache L., Layadi A., Dogheche E., and Riemens D. Euro. Phys. J.: Appl. Phys. 39 (2007) 1-5
20. Sathiaraj T.S. Microelectron. J. 39 (2008) 1395
21. Baba Ali E., El Maliki H., Bernede J.C., Sahnoun M., Khelil A., and Saadane O. Mater. Chem. Phys. 73 (2002) 78
22. Hur T., Lee I., Park H., Hwang Y.-H., and Kim H.-K. Solid State Commun. 130 (2004) 397
23. Choi C.G., Lee W.-J., Kim H.-G., Jung S., Lee W., Kim W., Kim S., and Yoon C. Thin Solid Films 258 (1995) 274
24. Yi C.-H., Shigesato Y., Yasui I., and Takaki S. Jpn. J. Appl. Phys. 34 (1995) L244
25. El Hichou A., Kachouane A., Budendorff J.L., Addou M., Ebothe J., Troyon M., and Bougrine A. Thin Solid Films 458 (2004) 263
26. Joshi R.N., Singh V.P., and McClure J.C. Thin Solid Films 257 (1995) 32-35
27. Manifacier J.C., and Fillard J.P. Thin Solid Films 77 (1981) 67
28. Higuchi M., Uekusa S., Nakano R., and Yokogawa K. Jpn. J. Appl. Phys. 33 (1994) 302