The growth of indium-tin-oxide thin films on glass substrates using DC reactive magnetron sputtering

Vacuum

Volumn 72, Issue 3, 2003, Pages 269-276

  Lee, Ho Chul ^a   Seo, Ji Yoon ^a   Choi, Yong Won ^a   Lee, Dong Wook ^a  

^a Samsung Corning Co Ltd   (South Korea)

Author keywords

DC magnetron; Glass substrate; Indium tin oxide (ITO); Sputtering

Indexed keywords

CARRIER CONCENTRATION; GLASS; GROWTH (MATERIALS); INDIUM COMPOUNDS; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY;

DOMAIN BOUNDARIES;

THIN FILMS;

EID: 0142217256     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.08.001     Document Type: Article

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