Thickness dependence of In2O3: Sn film growth

Thin Solid Films

Volumn 466, Issue 1-2, 2004, Pages 250-258

  Qiao, Z ^a   Latz, R ^b   Mergel, D ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b WESTPHALIAN UNIVERSITY OF APPLIED SCIENCES   (Germany)

Author keywords

Growth mechanism (175); Indium tin oxide (208); Sputtering (444); Structural properties (448)

Indexed keywords

CERAMIC MATERIALS; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; INDIUM COMPOUNDS; PARAMETER ESTIMATION; POLYCRYSTALLINE MATERIALS; QUARTZ; SPUTTERING; THERMAL EFFECTS; THICKNESS MEASUREMENT; X RAY DIFFRACTION;

GROWTH MECHANISM; INDIUM TIN OXIDE; STRUCTURAL PROPERTIES; X-RAY DIFFRACTOGRAMS;

THIN FILMS;

EID: 4544323062     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.094     Document Type: Article

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