Ellipsometry as a high-precision technique for subnanometer-resolved monitoring of thin-film structures

Nanotechnologies in Russia

Volumn 4, Issue 3-4, 2009, Pages 201-214

  Shvets, V A ^a   Spesivtsev, E V ^a   Rykhlitskii, S V ^a   Mikhailov, N N ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETERS; ELLIPSOMETRIC MEASUREMENTS; HIGH SENSITIVITY; HIGH-PRECISION; MATERIAL SCIENCE; RUSSIAN ACADEMY OF SCIENCES; SEMICONDUCTOR HETEROSTRUCTURES; SEMICONDUCTOR PHYSICS; SUBNANOMETER; THIN-FILM STRUCTURE;

MERCURY (METAL); SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING TELLURIUM; SURFACE CHEMISTRY;

ELLIPSOMETRY;

EID: 78651565996     PISSN: 19950780     EISSN: 19950799     Source Type: Journal    
DOI: 10.1134/S1995078009030082     Document Type: Article

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