SCOPUS 정보 검색 플랫폼

Volumn 509, Issue 5, 2011, Pages 2054-2059

Effect of bottom electrode and resistive layer on the dielectric and ferroelectric properties of sol-gel derived BiFeO3 thin films

(2) Huang, A a Shannigrahi, S R a

a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

Author keywords

BiFeO3; Ferroelectric properties; La2O3; RuO2; Sol gel

Indexed keywords

APPLIED ELECTRIC FIELD; BFO FILMS; BIFEO3; BOTTOM ELECTRODES; CHEMICAL SOLUTION METHOD; COERCIVE FIELD; DIELECTRIC AND FERROELECTRIC PROPERTIES; DIELECTRIC CONSTANTS; FERROELECTRIC PROPERTY; FOWLER-NORDHEIM; LA2O3; LEAKAGE MECHANISM; RELATIVE PERMITTIVITY; REMNANT POLARIZATIONS; RUO2; SI SUBSTRATES; SPACE-CHARGE-LIMITED CURRENT; XRD PATTERNS;

ASTATINE; BISMUTH COMPOUNDS; ELECTRIC FIELDS; FERROELECTRICITY; GELS; PERMITTIVITY; POLARIZATION; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; SILICON; SOL-GEL PROCESS; SOL-GELS; SOLS;

ELECTRIC PROPERTIES;

EID: 78651369177 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.10.135 Document Type: Article

Times cited : (40)

References (51)

1
- 33846006566
- R. Ramesh, and N. Spaldin Nat. Mater. 6 2007 21
- (2007) Nat. Mater. , vol.6 , pp. 21
- Ramesh, R.¹ Spaldin, N.²

2
- 77956618787
- J. Wu, and J. Wang J. Alloys Compd. 507 2010 L4
- (2010) J. Alloys Compd. , vol.507 , pp. 4
- Wu, J.¹ Wang, J.²

3
- 67649246400
- G. Catalan, and J.F. Scott Adv. Mater. 21 2009 2463
- (2009) Adv. Mater. , vol.21 , pp. 2463
- Catalan, G.¹ Scott, J.F.²

4
- 67349223630
- T. Xian, H. Yang, X. Shen, J.L. Jiang, Z.Q. Wei, and W.J. Feng J. Alloys Compd. 480 2009 889
- (2009) J. Alloys Compd. , vol.480 , pp. 889
- Xian, T.¹ Yang, H.² Shen, X.³ Jiang, J.L.⁴ Wei, Z.Q.⁵ Feng, W.J.⁶

5
- 39349092203
- H.W. Jang, S.H. Baek, D. Ortiz, C.M. Folkman, C.B. Eom, Y.H. Chu, P. Shafer, R. Ramesh, V. Vaithyanathan, and D.G. Schlom Appl. Phys. Lett. 92 2008 062910
- (2008) Appl. Phys. Lett. , vol.92 , pp. 062910
- Jang, H.W.¹ Baek, S.H.² Ortiz, D.³ Folkman, C.M.⁴ Eom, C.B.⁵ Chu, Y.H.⁶ Shafer, P.⁷ Ramesh, R.⁸ Vaithyanathan, V.⁹ Schlom, D.G.¹⁰

6
- 33750485819
- X.J. Lou, X.J.M. Zhang, M.S.A.T. Redfern, and J.F. Scott Phys. Rev. Lett. 97 2007 177601
- (2007) Phys. Rev. Lett. , vol.97 , pp. 177601
- Lou, X.J.¹ Zhang, X.J.M.² Redfern, M.S.A.T.³ Scott, J.F.⁴

7
- 33846252715
- S.R. Shannigrahi, A. Huang, N. Chandrasekhar, D. Tripathy, and A.O. Adeyeye Appl. Phys. Lett. 90 2007 022901
- (2007) Appl. Phys. Lett. , vol.90 , pp. 022901
- Shannigrahi, S.R.¹ Huang, A.² Chandrasekhar, N.³ Tripathy, D.⁴ Adeyeye, A.O.⁵

8
- 48249148727
- A. Huang, S.R. Shannigrahi, and V.K.X. Lin Eletrochem. Solid-State Lett. 11 2008 G47
- (2008) Eletrochem. Solid-State Lett. , vol.11 , pp. 47
- Huang, A.¹ Shannigrahi, S.R.² Lin, V.K.X.³

9
- 77956610351
- X. Zhang, Y. Sui, X. Wang, Y. Wang, and Z. Wang J. Alloys Compd. 507 2010 157
- (2010) J. Alloys Compd. , vol.507 , pp. 157
- Zhang, X.¹ Sui, Y.² Wang, X.³ Wang, Y.⁴ Wang, Z.⁵

10
- 36248930886
- S.K. Singh, H. Ishiwara, K. Sata, and K. Maruyama J. Appl. Phys. 102 2007 094109
- (2007) J. Appl. Phys. , vol.102 , pp. 094109
- Singh, S.K.¹ Ishiwara, H.² Sata, K.³ Maruyama, K.⁴

11
- 65449119488
- N.M. Murari, R. Thomas, A. Winterman, R.E. Melgarejo, S.P. Pavunny, and R.S. Katiyar J. Appl. Phys. 105 2009 084110
- (2009) J. Appl. Phys. , vol.105 , pp. 084110
- Murari, N.M.¹ Thomas, R.² Winterman, A.³ Melgarejo, R.E.⁴ Pavunny, S.P.⁵ Katiyar, R.S.⁶

12
- 67349251988
- A.Z. Simões, R.F. Pianno, E.C. Aguiar, E. Longo, and J.A. Varela J. Alloys Compd. 479 2009 274
- (2009) J. Alloys Compd. , vol.479 , pp. 274
- Simões, A.Z.¹ Pianno, R.F.² Aguiar, E.C.³ Longo, E.⁴ Varela, J.A.⁵

13
- 34547191627
- D. Lebeugle, D. Colson, A. Forget, and M. Viret Appl. Phys. Lett. 91 2007 022907
- (2007) Appl. Phys. Lett. , vol.91 , pp. 022907
- Lebeugle, D.¹ Colson, D.² Forget, A.³ Viret, M.⁴

14
- 34247874724
- C.C. Lee, J.M. Wu, and C.P. Hsiung Appl. Phys. Lett. 90 2007 182909
- (2007) Appl. Phys. Lett. , vol.90 , pp. 182909
- Lee, C.C.¹ Wu, J.M.² Hsiung, C.P.³

15
- 53649085160
- A.Z. Simoes, A.H.M. Gonzalez, E.C. Aguiar, C.S. Riccardi, E. Longo, and J.A. Varela Appl. Phys. Lett. 93 2008 142902
- (2008) Appl. Phys. Lett. , vol.93 , pp. 142902
- Simoes, A.Z.¹ Gonzalez, A.H.M.² Aguiar, E.C.³ Riccardi, C.S.⁴ Longo, E.⁵ Varela, J.A.⁶

16
- 77249090208
- J. Liu, M. Li, L. Pei, J. Wang, B. Yu, X. Wang, and X. Zhao J. Alloys Compd. 493 2010 544
- (2010) J. Alloys Compd. , vol.493 , pp. 544
- Liu, J.¹ Li, M.² Pei, L.³ Wang, J.⁴ Yu, B.⁵ Wang, X.⁶ Zhao, X.⁷

17
- 72049090644
- H. Liu, and X. Wang J. Alloys Compd. 485 2009 769
- (2009) J. Alloys Compd. , vol.485 , pp. 769
- Liu, H.¹ Wang, X.²

18
- 77955657137
- L.W. Martin, Y.-H. Chu, and R. Ramesh Mater. Sci. Eng. R 68 2010 89
- (2010) Mater. Sci. Eng. R , vol.68 , pp. 89
- Martin, L.W.¹ Chu, Y.-H.² Ramesh, R.³

19
- 74149087184
- Y. Du, Z.X. Cheng, M. Shahbazi, E.W. Collings, S.X. Dou, and X.L. Wang J. Alloys Compd. 490 2010 637
- (2010) J. Alloys Compd. , vol.490 , pp. 637
- Du, Y.¹ Cheng, Z.X.² Shahbazi, M.³ Collings, E.W.⁴ Dou, S.X.⁵ Wang, X.L.⁶

20
- 77953139737
- H. Zhang, X. Chen, T. Wang, F. Wang, and W. Shi J. Alloys Compd. 500 2010 46
- (2010) J. Alloys Compd. , vol.500 , pp. 46
- Zhang, H.¹ Chen, X.² Wang, T.³ Wang, F.⁴ Shi, W.⁵

21
- 10844282042
- Y. Kim, K. Miyauchi, S.-I. Ohmi, K. Tsutsui, and H. Iwai Microelectronics Journal 36 2005 41
- (2005) Microelectronics Journal , vol.36 , pp. 41
- Kim, Y.¹ Miyauchi, K.² Ohmi, S.-I.³ Tsutsui, K.⁴ Iwai, H.⁵

22
- 31944452194
- J.S. Ye, H.F. Cui, X. Liu, T.M. Lim, W.D. Zhang, and F.S. Shen Small 1 2005 560
- (2005) Small , vol.1 , pp. 560
- Ye, J.S.¹ Cui, H.F.² Liu, X.³ Lim, T.M.⁴ Zhang, W.D.⁵ Shen, F.S.⁶

23
- 0032679206
- W.T. Lim, K.R. Cho, and C.H. Lee Thin Solid Films 348 1999 56
- (1999) Thin Solid Films , vol.348 , pp. 56
- Lim, W.T.¹ Cho, K.R.² Lee, C.H.³

24
- 0003427458
- Addison-Wesley Reading, MA
- B.D. Culity Element of X-ray Diffraction 1978 Addison-Wesley Reading, MA
- (1978) Element of X-ray Diffraction
- Culity, B.D.¹

25
- 0003392447
- Wiley New York
- M.P. Klug, and L.E. Alexander X-ray Diffraction Procedure for Polycrystalline and Amorphous Materials 1974 Wiley New York p. 634
- (1974) X-ray Diffraction Procedure for Polycrystalline and Amorphous Materials
- Klug, M.P.¹ Alexander, L.E.²

26
- 0035897237
- M. Nieminen, M. Putkonen, and L. Niinisto Appl. Surf. Sci. 174 2001 155
- (2001) Appl. Surf. Sci. , vol.174 , pp. 155
- Nieminen, M.¹ Putkonen, M.² Niinisto, L.³

27
- 33747018260
- S.J. Jo, J.S. Ha, N.K. Park, D.K. Kang, and B.H. Kim Thin Solid Films 513 2006 253
- (2006) Thin Solid Films , vol.513 , pp. 253
- Jo, S.J.¹ Ha, J.S.² Park, N.K.³ Kang, D.K.⁴ Kim, B.H.⁵

28
- 2942672871
- J.B. Cheng, A.D. Lia, Q.Y. Shaoa, H.Q. Ling, D. Wu, Y. Wang, Y.J. Bao, M. Wang, Z.G. Liu, and N.B. Ming Appl. Surf. Sci. 233 2004 91
- (2004) Appl. Surf. Sci. , vol.233 , pp. 91
- Cheng, J.B.¹ Lia, A.D.² Shaoa, Q.Y.³ Ling, H.Q.⁴ Wu, D.⁵ Wang, Y.⁶ Bao, Y.J.⁷ Wang, M.⁸ Liu, Z.G.⁹ Ming, N.B.¹⁰

29
- 2942516636
- Z.J. Wang, Y. Aoki, L.J. Yan, H. Kokawa, and R. Maeda J. Cryst. Growth 267 2004 92
- (2004) J. Cryst. Growth , vol.267 , pp. 92
- Wang, Z.J.¹ Aoki, Y.² Yan, L.J.³ Kokawa, H.⁴ Maeda, R.⁵

30
- 60949108511
- M. Sreemany, A. Bose, and S. Sen Mater. Chem. Phys. 115 2009 453
- (2009) Mater. Chem. Phys. , vol.115 , pp. 453
- Sreemany, M.¹ Bose, A.² Sen, S.³

31
- 0031703699
- S.Y. Chen, and I.W. Chen J. Am. Ceram. Soc. 81 1998 97
- (1998) J. Am. Ceram. Soc. , vol.81 , pp. 97
- Chen, S.Y.¹ Chen, I.W.²

32
- 41649100677
- N.M. Murari, A. Kumar, R. Thomas, and R.S. Katiyar Appl. Phys. Lett. 92 2008 132904
- (2008) Appl. Phys. Lett. , vol.92 , pp. 132904
- Murari, N.M.¹ Kumar, A.² Thomas, R.³ Katiyar, R.S.⁴

33
- 36149023551
- M. Lampert Phys. Rev. 103 1956 1648
- (1956) Phys. Rev. , vol.103 , pp. 1648
- Lampert, M.¹

34
- 34548066514
- H. Yang, M. Jain, N.A. Suvorova, H. Zhou, H.M. Luo, D.M. Feldmann, P.C. Dowden, R.F. Depaula, S.R. Foltyn, and Q.X. Jia Appl. Phys. Lett. 91 2007 072911
- (2007) Appl. Phys. Lett. , vol.91 , pp. 072911
- Yang, H.¹ Jain, M.² Suvorova, N.A.³ Zhou, H.⁴ Luo, H.M.⁵ Feldmann, D.M.⁶ Dowden, P.C.⁷ Depaula, R.F.⁸ Foltyn, S.R.⁹ Jia, Q.X.¹⁰

35
- 63049106713
- T. Kawae, Y. Terauchi, H. Tsuda, M. Kumeda, and A. Morimoto Appl. Phys. Lett. 94 2009 112904
- (2009) Appl. Phys. Lett. , vol.94 , pp. 112904
- Kawae, T.¹ Terauchi, Y.² Tsuda, H.³ Kumeda, M.⁴ Morimoto, A.⁵

36
- 67650757430
- N.M. Murari, R. Thomas, R.E. Melgarejo, S.P. Pavunny, and R.S. Katiyar J. Appl. Phys. 106 2009 014103
- (2009) J. Appl. Phys. , vol.106 , pp. 014103
- Murari, N.M.¹ Thomas, R.² Melgarejo, R.E.³ Pavunny, S.P.⁴ Katiyar, R.S.⁵

37
- 33745196901
- C.F. Chung, J.P. Lin, and J.M. Wu Appl. Phys. Lett. 88 2006 242909
- (2006) Appl. Phys. Lett. , vol.88 , pp. 242909
- Chung, C.F.¹ Lin, J.P.² Wu, J.M.³

38
- 70349488343
- Z. Zhong, and H. Ishiwara Appl. Phys. Lett. 95 2009 112902
- (2009) Appl. Phys. Lett. , vol.95 , pp. 112902
- Zhong, Z.¹ Ishiwara, H.²

39
- 0036639287
- K.H. Ahn, S.S. Kim, and S.G. Baik J. Appl. Phys. 92 2002 421
- (2002) J. Appl. Phys. , vol.92 , pp. 421
- Ahn, K.H.¹ Kim, S.S.² Baik, S.G.³

40
- 0346502306
- Y.P. Wang, and T.Y. Tseng J. Appl. Phys. 81 1997 6762
- (1997) J. Appl. Phys. , vol.81 , pp. 6762
- Wang, Y.P.¹ Tseng, T.Y.²

41
- 0141817672
- J.G. Simmons Phys. Rev. 155 1967 657
- (1967) Phys. Rev. , vol.155 , pp. 657
- Simmons, J.G.¹

42
- 0009418612
- M. Sedlar, M. Sayer, and D.T. Amm J. Appl. Phys. 80 1996 367
- (1996) J. Appl. Phys. , vol.80 , pp. 367
- Sedlar, M.¹ Sayer, M.² Amm, D.T.³

43
- 0035881474
- F. Chen, B. Li, R.A. Dufresne, and R. Jammy J. Appl. Phys. 90 2001 1898
- (2001) J. Appl. Phys. , vol.90 , pp. 1898
- Chen, F.¹ Li, B.² Dufresne, R.A.³ Jammy, R.⁴

44
- 10444271691
- Y. Masuda, and T. Nozaka Jpn. J. Appl. Phys. 43 2004 6576
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 6576
- Masuda, Y.¹ Nozaka, T.²

45
- 43449132090
- D.J. Kim, D. Shen, S.H. Yoon, S.Y. Choe, and D.Y. Kaufman Ceram. Int. 34 2008 1261
- (2008) Ceram. Int. , vol.34 , pp. 1261
- Kim, D.J.¹ Shen, D.² Yoon, S.H.³ Choe, S.Y.⁴ Kaufman, D.Y.⁵

46
- 33847123580
- G.W. Pabst, L.W. Martin, Y.H. Chu, and R. Ramesh Appl. Phys. Lett. 90 2007 072902
- (2007) Appl. Phys. Lett. , vol.90 , pp. 072902
- Pabst, G.W.¹ Martin, L.W.² Chu, Y.H.³ Ramesh, R.⁴

47
- 34247519198
- S.K. Singh, K. Maruyama, and H. Ishiwara J. Phys. D: Appl. Phys. 40 2007 2705
- (2007) J. Phys. D: Appl. Phys. , vol.40 , pp. 2705
- Singh, S.K.¹ Maruyama, K.² Ishiwara, H.³

48
- 0037891913
- M.M. Kumar, V.R. Palkar, K. Srinivas, and S.V. Suryanarayana Appl. Phys. Lett. 76 2000 2764
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2764
- Kumar, M.M.¹ Palkar, V.R.² Srinivas, K.³ Suryanarayana, S.V.⁴

49
- 18744378644
- X. Qi, J. Dho, R. Tomov, M.G. Blamire, and J.L.M. Driscoll Appl. Phys. Lett. 86 2005 062903
- (2005) Appl. Phys. Lett. , vol.86 , pp. 062903
- Qi, X.¹ Dho, J.² Tomov, R.³ Blamire, M.G.⁴ Driscoll, J.L.M.⁵

50
- 0032154719
- J. Gao, L. Zheng, J. Zeng, and C. Lin Jpn. J. Appl. Phys. 37 1998 5126
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 5126
- Gao, J.¹ Zheng, L.² Zeng, J.³ Lin, C.⁴

51
- 70249097381
- K.T. Jacob, G. Rajitha, and V.S. Saji Bull. Mater. Sci. 32 2009 313
- (2009) Bull. Mater. Sci. , vol.32 , pp. 313
- Jacob, K.T.¹ Rajitha, G.² Saji, V.S.³

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