Effect of niobium dopant on fatigue characteristics of BiFeO3 thin films grown on Pt electrodes

Journal of Alloys and Compounds

Volumn 479, Issue 1-2, 2009, Pages 274-279

  Simoes A Z ^a   Pianno, R F ^a   Aguiar, E C ^a   Longo, E ^a   Varela, J A ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

Chemical synthesis; Ferroelectrics; Thin films; Transmission electron microscopy; X ray diffraction

Indexed keywords

BFO FILMS; CHEMICAL SYNTHESIS; EFFECT OF NIOBIUMS; ELECTRICAL PROPERTIES; FATIGUE CHARACTERISTICS; FERROELECTRICS; GRAIN SIZES; NIOBIUM CONTENTS; OXYGEN VACANCY CONCENTRATIONS; POLY-CRYSTALLINE; PT ELECTRODES; SI SUBSTRATES; SOFT CHEMICAL METHODS;

DIFFRACTION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRON MICROSCOPES; NIOBIUM; OXYGEN; OXYGEN VACANCIES; PLATINUM; SEMICONDUCTING BISMUTH COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SODIUM COMPOUNDS; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

X RAY DIFFRACTION ANALYSIS;

EID: 67349251988     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.01.074     Document Type: Review

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