Influence of chemical composition, phase and thickness of TiOx (x ≤ 2) seed layer on the growth and orientation of the perovskite phase in sputtered PZT thin films

Materials Chemistry and Physics

Volumn 115, Issue 1, 2009, Pages 453-462

  Sreemany, Monjoy ^a   Bose, Ankita ^a   Sen, Suchitra ^a  

^a CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

Author keywords

Microstructure; Phase transformations; Sputtering; Thin films

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; FILM GROWTH; LEAD; MICROSTRUCTURE; PEROVSKITE; PIEZOELECTRIC ACTUATORS; PIEZOELECTRIC MATERIALS; PIEZOELECTRIC TRANSDUCERS; SEMICONDUCTING LEAD COMPOUNDS; SURFACE MORPHOLOGY; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; ZIRCONIUM;

AIR-ANNEALING; AMORPHOUS TIO; ANATASE TIO; CHEMICAL COMPOSITIONS; CRYSTALLINE PHASE; GLASS SUBSTRATES; LEAD ZIRCONATE TITANATES; PEROVSKITE PHASE; PEROVSKITE PHASE FORMATIONS; PHASE TRANSFORMATIONS; PZT; PZT FILMS; PZT THIN FILMS; R.F. MAGNETRON SPUTTERING; ROSETTE STRUCTURES; RUTILE TIO; SEED FILMS; SEED LAYER THICKNESS; SEED LAYERS;

OXIDE MINERALS;

EID: 60949108511     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.01.009     Document Type: Article

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