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Journal of Applied Physics

Volumn 102, Issue 9, 2007, Pages

Microstructure and frequency dependent electrical properties of Mn-substituted BiFe O3 thin films

(4) Singh, S K a Ishiwara, H a Sato, K b Maruyama, K b

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

b FUJITSU LABORATORIES LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; HYSTERESIS LOOPS; LEAKAGE CURRENTS; MANGANESE; MICROSTRUCTURE; REMANENCE; SEMICONDUCTING BISMUTH COMPOUNDS; SUBSTITUTION REACTIONS; X RAY DIFFRACTION ANALYSIS;

CHEMICAL SOLUTIONS; LEAKAGE CURRENT DENSITY; TRIANGULAR VOLTAGE;

THIN FILMS;

EID: 36248930886 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2812594 Document Type: Article

Times cited : (162)

References (15)

1
- 0034229229
- N. A. Hill, J. Phys. Chem. B 104, 6694 (2000).
- (2000) J. Phys. Chem. B , vol.104 , pp. 6694
- Hill, N.A.¹

2
- 0037167870
- M. Fiebig, T. Lottermoser, D. Frohlich, A. V. Goltsev, and R. V. Pisarev, Nature (London) 419, 818 (2002).
- (2002) Nature (London) , vol.419 , pp. 818
- Fiebig, M.¹ Lottermoser, T.² Frohlich, D.³ Goltsev, A.V.⁴ Pisarev, R.V.⁵

3
- 0035195848
- R. Seshadri and N. A. Hill, Chem. Mater. 13, 2892 (2001).
- (2001) Chem. Mater. , vol.13 , pp. 2892
- Seshadri, R.¹ Hill, N.A.²

4
- 0037436499
- J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719 (2003).
- (2003) Science , vol.299 , pp. 1719
- Wang, J.¹ Neaton, J.B.² Zheng, H.³ Nagarajan, V.⁴ Ogale, S.B.⁵ Liu, B.⁶ Viehland, D.⁷ Vaithyanathan, V.⁸ Schlom, D.G.⁹ Waghmare, U.V.¹⁰ Spaldin, N.A.¹¹ Rabe, K.M.¹² Wuttig, M.¹³ Ramesh, R.¹⁴

5
- 0014811477
- J. R. Teague, R. Gerson, and W. J. James, Solid State Commun. 8, 1073 (1970).
- (1970) Solid State Commun. , vol.8 , pp. 1073
- Teague, J.R.¹ Gerson, R.² James, W.J.³

6
- 3142655788
- J. Li, J. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett. 84, 5261 (2004).
- (2004) Appl. Phys. Lett. , vol.84 , pp. 5261
- Li, J.¹ Wang, J.² Wuttig, M.³ Ramesh, R.⁴ Wang, N.⁵ Ruette, B.⁶ Pyatakov, A.P.⁷ Zvezdin, A.K.⁸ Viehland, D.⁹

7
- 4944237949
- K. Y. Yun, M. Noda, M. Okuyama, H. Saeki, H. Tabata, and K. Saito, J. Appl. Phys. 96, 3399 (2004).
- (2004) J. Appl. Phys. , vol.96 , pp. 3399
- Yun, K.Y.¹ Noda, M.² Okuyama, M.³ Saeki, H.⁴ Tabata, H.⁵ Saito, K.⁶

8
- 24644449094
- S. Y. Yang, F. Zavaliche, L. M. Ardabili, V. Vaithyanathan, D. G. Schlom, Y. J. Lee, Y. H. Chu, M. P. Cruz, Q. Zhan, T. Zhao, and R. Ramesh, Appl. Phys. Lett. 87, 102903 (2005).
- (2005) Appl. Phys. Lett. , vol.87 , pp. 102903
- Yang, S.Y.¹ Zavaliche, F.² Ardabili, L.M.³ Vaithyanathan, V.⁴ Schlom, D.G.⁵ Lee, Y.J.⁶ Chu, Y.H.⁷ Cruz, M.P.⁸ Zhan, Q.⁹ Zhao, T.¹⁰ Ramesh, R.¹¹

9
- 27744559467
- Y. H. Lee, C. S. Liang, and J. M. Wu, Electrochem. Solid-State Lett. 8, F55 (2005).
- (2005) Electrochem. Solid-State Lett. , vol.8 , pp. 55
- Lee, Y.H.¹ Liang, C.S.² Wu, J.M.³

10
- 33646170535
- S. K. Singh, Y. K. Kim, H. Funakubo, and H. Ishiwara, Appl. Phys. Lett. 88, 162904 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 162904
- Singh, S.K.¹ Kim, Y.K.² Funakubo, H.³ Ishiwara, H.⁴

11
- 23944454826
- S. K. Singh and H. Ishiwara, Jpn. J. Appl. Phys., Part 2 44, L734 (2005).
- (2005) Jpn. J. Appl. Phys., Part 2 , vol.44 , pp. 734
- Singh, S.K.¹ Ishiwara, H.²

12
- 33745625140
- S. K. Singh, H. Ishiwara, and K. Maruyama, Appl. Phys. Lett. 88, 262908 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 262908
- Singh, S.K.¹ Ishiwara, H.² Maruyama, K.³

13
- 0037394341
- V. R. Palkar, D. C. Kundaliya, and S. K. Malik, J. Appl. Phys. 93, 4337 (2003).
- (2003) J. Appl. Phys. , vol.93 , pp. 4337
- Palkar, V.R.¹ Kundaliya, D.C.² Malik, S.K.³

14
- 31544452525
- S. K. Singh, R. Ueno, H. Funakubo, H. Uchida, S. Koda, and H. Ishiwara, Jpn. J. Appl. Phys., Part 1 44, 8525 (2005).
- (2005) Jpn. J. Appl. Phys., Part 1 , vol.44 , pp. 8525
- Singh, S.K.¹ Ueno, R.² Funakubo, H.³ Uchida, H.⁴ Koda, S.⁵ Ishiwara, H.⁶

15
- 29144507389
- C. Ederer and N. A. Spaldin, Phys. Rev. Lett. 95, 257601 (2005).
- (2005) Phys. Rev. Lett. , vol.95 , pp. 257601
- Ederer, C.¹ Spaldin, N.A.²

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