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Volumn 106, Issue 1, 2009, Pages

Structural, electrical, and magnetic properties of chemical solution deposited BiFe1-x Tix O3 and BiFe0.9 Ti0.05 Co0.05 O3 thin films

(5) Murari, N M a Thomas, R a Melgarejo, R E a Pavunny, S P a Katiyar, R S a

a UNIVERSITY OF PUERTO RICO (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

BFO FILMS; BUTTERFLY LOOP; CAPACITANCE VOLTAGE CHARACTERISTIC; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTIONS; COSUBSTITUTION; FERROELECTRIC PROPERTY; FERROMAGNETIC HYSTERESIS; INTRINSIC PROPERTY; LOW TEMPERATURES; ROOM TEMPERATURE; SATURATED POLARIZATION; SI SUBSTRATES; SPACE CHARGE LIMITED CURRENTS; TIO; VOLTAGE HYSTERESIS;

CHEMICALS; ELECTRIC POTENTIAL; FERROELECTRICITY; HYSTERESIS; MAGNETIC PROPERTIES; PHOTORESISTS; SEMICONDUCTING BISMUTH COMPOUNDS; SILICON COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS;

GRAIN GROWTH;

EID: 67650757430 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3158556 Document Type: Article

Times cited : (72)

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