Nano/micro-mechanical and tribological characterization of Ar, C, N, and Ne Ion-Implanted SI

Journal of Materials Research

Volumn 25, Issue 5, 2010, Pages 880-889

  Xu, Zhi Hui ^a   Park, Young Bae ^b   Li, Xiaodong ^a  

^a University of South Carolina   (United States)

^b California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE MECHANISM; MECHANICAL AND TRIBOLOGICAL PROPERTIES; MICRO INDENTATION; MICRO-SCALES; MICROSCRATCHES; NANO SCALE; SEMICONDUCTOR INDUSTRY; SINGLE CRYSTALLINE SILICON; SINGLE-CRYSTAL SI; TRIBOLOGICAL BEHAVIORS; TRIBOLOGICAL CHARACTERIZATION; WEAR TEST;

FRACTURE; FRACTURE TOUGHNESS; ION IMPLANTATION; NANOINDENTATION; NEON; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SINGLE CRYSTALS; TRIBOLOGY;

MECHANICAL PROPERTIES;

EID: 77958140783     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2010.0117     Document Type: Article

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