An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films

Journal of Physics D: Applied Physics

Volumn 41, Issue 4, 2008, Pages

  Shi, Baogui ^a   Sullivan, John L ^a   Beake, Ben D ^b  

^a ASTON UNIVERSITY   (United Kingdom)

^b MICRO MATERIALS LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; SILICON COMPOUNDS; SPUTTERING; ULTRATHIN FILMS; WEAR RESISTANCE;

HIGH SUBSTRATE BIAS; NANOWEAR DATA; SCRATCH TRACK; THIN SPUTTERED CARBON FILMS;

CARBON FILMS;

EID: 38949156540     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/4/045303     Document Type: Article

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