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Volumn 5, Issue 3-5, 1996, Pages 514-518

Formation of crystalline silicon carbon nitride films by microwave plasma-enhanced chemical vapor deposition

Author keywords

Carbon nitride; Microwave PECVD; Transmission electron diffraction; X Ray photoelectron spectroscopy

Indexed keywords


EID: 0000140081     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(96)80070-7     Document Type: Article
Times cited : (115)

References (26)
  • 2
    • 20444373328 scopus 로고
    • A.Y. Liu and M.L. Cohen, Science, 245 (1989) 841; Phys. Rev. B, 42 (1990) 10727.
    • (1989) Science , vol.245 , pp. 841
    • Liu, A.Y.1    Cohen, M.L.2
  • 3
    • 6144285258 scopus 로고
    • A.Y. Liu and M.L. Cohen, Science, 245 (1989) 841; Phys. Rev. B, 42 (1990) 10727.
    • (1990) Phys. Rev. B , vol.42 , pp. 10727
  • 16
    • 0041358951 scopus 로고    scopus 로고
    • in press
    • Z.J. Zhang, S. Fan and C.M. Lieber, Appl. Phys. Lett., in press, and MRS Proc., 388, in press.
    • MRS Proc. , pp. 388


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.