Nanomechanical properties of ion-implanted Si

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 875-880

  Nagy, P M ^a   Aranyi, D ^a   Horvath P ^b   Peto, G ^c   Kalman E ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

^b SEMILAB SEMICONDUCTOR PHYSICS LABORATORY CO LTD   (Hungary)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

AFM; Ion implantation; Mechanical properties; Nanoindentation

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; HYSTERESIS LOOPS; ION IMPLANTATION; NANOINDENTATION; NANOMECHANICS; PHASE TRANSITIONS; SILICON;

LOADING EFFECTS; NANOMECHANICAL PROPERTIES;

SINGLE CRYSTALS;

EID: 42449160689     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2777     Document Type: Conference Paper

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