Adamantane-based molecular glass resist for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Tanaka, Shinji ^a   Murakami, Miki ^a   Fukushima, Kazuya ^a   Kawano, Naoya ^a   Uenoyama, Yoshitaka ^a   Ito, Katsuki ^a   Ohno, Hidetoshi ^a   Matsumoto, N ^a  

^a IDEMITSU KOSAN CO LTD   (Japan)

Author keywords

Adamantane; Amorphous; Cholic acid; Etch resistance; LER; Molecular glass resist; Roughness

Indexed keywords

ADAMANTANE; AMORPHOUS; CHOLIC ACID; ETCH RESISTANCE; LER; MOLECULAR GLASS RESIST; ROUGHNESS;

ACID RESISTANCE; ACIDS; ESTERS; FUNCTIONAL GROUPS; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; ROUGHNESS MEASUREMENT; SOLUBILITY; TERNARY SYSTEMS;

GLASS;

EID: 65849403182     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814070     Document Type: Conference Paper

References (20)

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