Molecular resists based on calix[4]resorcinarene derivatives for EB lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Okuyama, Kenichi ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Calix 4 resorcinarene derivative; Dissolution rate; E beam lithography; Molecular resist

Indexed keywords

ALKALINE DEVELOPER; CALIX[4]RESORCINARENE; CALIX[4]RESORCINARENE DERIVATIVE; CALIXARENE; CALIXARENES; CHEMICAL AMPLIFIED RESISTS; CROSS-LINKERS; DISSOLUTION RATE; DISSOLUTION RATES; E-BEAM LITHOGRAPHY; EB LITHOGRAPHY; ELECTRON-BEAM EXPOSURE; HIGH SOLUBILITY; LINE EDGE ROUGHNESS; MOLECULAR RESIST; MOLECULAR RESISTS; NEGATIVE TONES; NEXT GENERATION LITHOGRAPHY; PHOTOACID GENERATORS; RESEARCH GROUPS; RESIST COMPONENTS; RESIST MATERIALS;

CORROSION RESISTANT ALLOYS; DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; OPTICAL GLASS; PHENOLS; SUBSTRATES;

DERIVATIVES;

EID: 65849450778     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813632     Document Type: Conference Paper

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