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Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 429-436

Characterization of negative-tone molecular resist for EUV and EB lithography

(5) Kojima, Kyoko a Mori, Shigeki a Shiono, Daiju b Hada, Hideo b Onodera, Junichi b

a HITACHI LTD (Japan)

b TOKYO OHKA KOGYO CO LTD (Japan)

Author keywords

EB lithography; Lactonization; Negative tone; Polarity change; Polyphenol; Resist

Indexed keywords

EID: 36148934210 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.20.429 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.