Spectroscopic and modeling investigations of the Gas phase chemistry and composition in microwave plasma activated B2H6/CH 4/Ar/H2 mixtures

Journal of Physical Chemistry A

Volumn 114, Issue 37, 2010, Pages 10076-10089

  Ma, Jie ^a   Richley, James C ^a   Davies, David R W ^a   Ashfold, Michael N R ^a   Mankelevich, Yuri A ^b  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AIR IMPURITIES; B ATOMS; CAVITY RING DOWN SPECTROSCOPIES; CHEMICAL KINETICS; COLUMN DENSITY; COMPREHENSIVE STUDIES; CONCENTRATION PROFILES; COUPLING REACTION; DOPED DIAMONDS; DOPED-DIAMOND FILMS; EXPERIMENTAL DATA; GAS PHASE CHEMISTRY; GASPHASE; MICROWAVE PLASMA; MOLYBDENUM SUBSTRATE; PLASMA CHEMISTRIES; PLASMA PROCESS; PROCESS CONDITION; PROCESS GAS; RADICAL DENSITIES; RELATIVE DENSITY; SPATIAL EXTENT; TOTAL PRESSURE;

ATOMIC SPECTROSCOPY; ATOMS; BORON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; EMISSION SPECTROSCOPY; EXCITED STATES; GASES; HYDROCARBONS; MOLYBDENUM; OPTICAL EMISSION SPECTROSCOPY; THERMOCHEMISTRY;

PLASMAS;

ARGON; BORON DERIVATIVE; HYDROGEN; METHANE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; GAS; INFRARED SPECTROPHOTOMETRY; MICROWAVE RADIATION; ULTRAVIOLET SPECTROPHOTOMETRY;

ARGON; BORON COMPOUNDS; GASES; HYDROGEN; METHANE; MICROWAVES; MODELS, CHEMICAL; SPECTROPHOTOMETRY, INFRARED; SPECTROPHOTOMETRY, ULTRAVIOLET;

EID: 77956767465     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp104532y     Document Type: Article

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