Optical emission study of a doped diamond deposition process by plasma enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 104, Issue 3, 2008, Pages

  Rayar, M ^a,b   Supiot, P ^a   Veis, P ^c   Gicquel, A ^b  

^a UNIV LILLE   (France)

^b UNIVERSITÉ PARIS 13   (France)

^c Physics and Informatics   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; BORON; BORON COMPOUNDS; CHEMISTRY; DIAMOND DEPOSITS; DIAMOND FILMS; DIAMONDS; EMISSION SPECTROSCOPY; ESTIMATION; FILM GROWTH; FUNCTIONAL GROUPS; HYDROGEN; LEAKAGE (FLUID); LIGHT EMISSION; MOLECULAR SPECTROSCOPY; NEON; NONMETALS; OPTICAL EMISSION SPECTROSCOPY; PARAMETER ESTIMATION; PHASE EQUILIBRIA; PHOTORESISTS; PLASMA DEPOSITION; PLASMAS; STANDARDS;

AXIAL PROFILES; B ATOMS; BORON HYDRIDES; CARBON RATIO; CHEMICAL KINETIC MODELING; DIAMOND DEPOSITION; DIAMOND FILM GROWTH; DIBORANE; EMISSION INTENSITIES; EMISSION SPECTRUMS; EXPERIMENTAL CONDITIONS; EXPERIMENTAL MEASUREMENTS; GAS-PHASE CHEMISTRY; MICROWAVE POWER DENSITY; MODEL BASED; NUMBER DENSITIES; OPTICAL EMISSIONS; ORGANIC CHEMISTRY; PLASMA MODELING; PLASMA PARAMETERS; RADICAL SPECIES; UPPER LIMITS; VARIATIONS OF; ZERO-DIMENSIONAL;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 49749149570     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2949271     Document Type: Article

References (48)

1. T. Kobayashi, T. Ariki, M. Iwabuchi, T. Maki, S. Shikama, and S. Suzuki, J. Appl. Phys. 76, 1977 (1994).
2. H. Shiomi, Y. Nishibayashi, N. Toda, and S. Shikata, IEEE Electron Device Lett. 16, 36 (1995).
3. A. Aleksov, M. Kubovic, N. Kaeb, U. Stizberg, A. Bermaier, G. Dollinger, Th. Bauer, M. Schreck, B. Stitzker, and E. Kohn, Diamond Relat. Mater. 12, 391 (2003).
4. M. Kunze, A. Vescan, G. Dollinger, A. Bermaeir, and E. Kohn, Carbon 37, 787 (1999).
5. A. Vescan, P. Gluche, W. Ebert, and E. Kohn, IEEE Electron Device Lett. 18, 222 (1997).
6. A. Aleksov, A. Vescan, M. Kunze, P. Gluche, W. Ebert, E. Kohn, A. Bergmaier, and G. Dollinger, Diamond Relat. Mater. 8, 941 (1999).
7. H. Kawarada, Surf. Sci. Rep. 26, 205 (1996).
8. A. Hokazono, K. Tsugawa, H. Umezawa, K. Kitatani, and H. Kawarada, Solid-State Electron. 43, 1465 (1999).
9. H. Ishizaka, H. Umezawa, H. Taniuchi, T. Arima, N. Fujihara, M. Tachiki, and H. Kawarada, Diamond Relat. Mater. 11, 378 (2002).
10. S. Miyamoto, H. Matsudiara, H. Ishizaka, K. Nakazawa, H. Taniuchi, H. Umezawa, M. Tachiki, and H. Kawarada, Diamond Relat. Mater. 12, 399 (2003).
11. H. Taniuchi, H. Umezawa, T. Arima, M. Tachiki, and H. Kawarada, IEEE Electron Device Lett. 22, 390 (2001).
12. K. Miyata, K. Nishemura, and K. Kobashi, IEEE Trans. Electron Devices 42, 2010 (1995).
13. D. Twitchen, A. Whitehead, S. Coe, J. Isberg, J. Hammersberg, T. Wilkstfm, and E. Johansson, IEEE Trans. Electron Devices 51, 826 (2004).
14. A. Vescan, P. Gluche, W. Ebert, and E. Kohn, Diamond Relat. Mater. 7, 581 (1998).
15. J. Butler, M. Geis, K. Krohn, J. Lawless, S. Deneault, T. Lyszczaz, D. Fletcher, and R. Wright, Semicond. Sci. Technol. 18, S67 (2003).
16. E. A. Ekimov, V. A. Sidorov, E. D. Bauer, N. N. Mel'nik, N. J. Curro, J. D. Thompson, and S. M. Stishov, Nature (London) 428, 542 (2004).
17. M. Rayar, P. Veis, C. Foissac, P. Supiot, and A. Gicquel, J. Phys. D: Appl. Phys. 39, 2151 (2006).
18. K. Hassouni, O. Leroy, S. Farhat, and A. Gicquel, Plasma Chem. Plasma Process. 18, 325 (1998).
19. A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C. D. Scott, and M. Lefebvre, Diamond Relat. Mater. 3, 581 (1994).
20. A. Gicquel, M. Chenevier, K. Hassouni, A. Tserepi, and M. Dubus, J. Appl. Phys. 83, 7504 (1998).
21. K. Hassouni, A. Gicquel, M. Capitelli, and J. Loureiros, Plasma Sources Sci. Technol. 8, 494 (1999).
22. G. P. Smith and D. R. Crosley, J. Chem. Phys. 85, 3896 (1985).
23. Y. C. Hsiao, D. K. Liu, H. S. Fung, and K. C. Lin, J. Chem. Phys. 113, 4613 (2000).
24. Y. Benhui, P. C. Stancil, N. Balakrishnan, and R. C. Forrey, J. Chem. Phys. 124, 104304 (2006).
25. G. Lombardi, K. Hassouni, G. D. Stancu, L. Mechold, J. Röpcke, and A. Gicquel, J. Appl. Phys. 98, 053303 (2005).
26. G. Lombardi, K. Hassouni, G. D. Stancu, L. Mechold, J. Röpcke, and A. Gicquel, Plasma Sources Sci. Technol. 14, 440 (2005).
27. G. Lombardi, " Spectroscopic diagnostics of carbon species and microwaves plasmas physic-chemistry modeling in H2 C H4 and Ar H2 C H4 mixtures for diamond deposition.," Ph.D., thesis, Orsay University, 2003.
28. P. J. Marchalant and K. Bartschat, J. Phys. B 30, 4373 (1997).
29. B. P. Lavrov, M. Osiac, A. V. Pipa, and J. Röpcke, Plasma Sources Sci. Technol. 12, 576 (2003).
30. O. Ńd́lec and J. Dufayard, J. Chem. Phys. 76, 378 (1982).
31. K. Sato, N. Kanda, T. Ogataand, and Y. Kumashiro, Chem. Phys. Lett. 325, 453 (2000).
32. J. F. Stanton, W. N. Lipscomb, and R. J. Bartletts, J. Am. Chem. Soc. 111, 5165 (1989).
33. R. E. Enrione and R. Schaeffer, J. Inorg. Nucl. Chem. 18, 103 (1961).
34. G. L. Brennan and R. Schaeffer, J. Inorg. Nucl. Chem. 20, 205 (1961).
35. M. Osiac, B. P. Lavrov, and J. Röpcke, J. Quant. Spectrosc. Radiat. Transf. 74, 471 (2002).
36. M. Osiac, L. Mechold, and J. Röpcke, Proceedings of the Workshop on Frontiers in Low Temperature Plasma Diagnostics IV, Rolduc, The Netherlands, 25-29 March 2001, p. 116.
37. K. Peter, C. Vollhardt, and N. E. Schore, Organic Chemistry Treatise, 3rd ed. (Freeman, San Francisco, CA, 1999), p. 502.
38. P. Hassanzadeh and L. Andrews, J. Am. Chem. Soc. 114, 9239 (1992).
39. P. Hassanzadeh, Y. Hannachi, and L. Andrews, J. Phys. Chem. 97, 6418 (1993).
40. J. M. L. Martin, P. R. Taylor, P. Hassanzadeh, and L. Andrews, J. Am. Chem. Soc. 115, 2511 (1993).
41. L. Andrews, P. Hassanzadeh, J. M. L. Martin, and P. R. Taylor, J. Phys. Chem. 97, 5839 (1993).
42. T. Mitomo, T. Ohta, E. Kondoh, and K. Ohtsuka, J. Appl. Phys. 70, 4532 (1991).
43. Y. Hannachi, P. Hanssanzadeh, and L. Andrews, J. Phys. Chem. 98, 6950 (1994).
44. A. Canosa, S. D. Le Picard, and W. D. Geppert, J. Phys. Chem. A 108, 6183 (2004).
45. S. W. Mayer and L. Schieler, J. Chem. Phys. 45, 385 (1966).
46. H. B. Schlegel and S. J. Harris, J. Phys. Chem. 98, 11178 (1994).
47. W. D. Geppert, F. Goulay, C. Naulin, M. Costes, A. Canosa, S. D. Le Picard, and B. R. Rowe, Phys. Chem. Chem. Phys. 6, 566 (2004).
48. A. Gicquel, K. Hassouni, F. Silva, and J. Achard, Curr. Appl. Phys. 1, 479 (2001).