Integrated sustainability analysis of atomic layer deposition for microelectronics manufacturing

Journal of Manufacturing Science and Engineering

Volumn 132, Issue 3, 2010, Pages 0309181-0309187

  Yuan, Chris Y ^a   Dornfeld, David A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Al2O3 dielectric film; Atomic layer deposition; Energy flow analysis; Saterial flow analysis; Sustainable manufacturing

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; DIELECTRIC MATERIALS; ENERGY UTILIZATION; ENTERTAINMENT INDUSTRY; ENVIRONMENTAL IMPACT; ENVIRONMENTAL MANAGEMENT; ENVIRONMENTAL TECHNOLOGY; HIGH-K DIELECTRIC; MICROELECTRONIC PROCESSING; MICROELECTRONICS; SUSTAINABLE DEVELOPMENT;

ECONOMIC AND ENVIRONMENTAL PERFORMANCE; ENERGY FLOW ANALYSIS; FLOW ANALYSIS; MATERIAL AND ENERGY FLOWS; MICROELECTRONICS MANUFACTURING; SUSTAINABILITY ANALYSIS; SUSTAINABILITY PERFORMANCE; SUSTAINABLE MANUFACTURING;

ATOMIC LAYER DEPOSITION;

EID: 77955324988     PISSN: 10871357     EISSN: 15288935     Source Type: Journal    
DOI: 10.1115/1.4001686     Document Type: Article

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