Measurement of dipoles/roll-off /work functions by coupling CV and IPE and study of their dependence on fabrication process

IEEE Transactions on Electron Devices

Volumn 57, Issue 8, 2010, Pages 1809-1819

  Charbonnier, Matthieu ^a   Leroux, Charles ^a   Cosnier, V ^b   Besson, P ^b   Martinez, E ^a   Benedetto, N ^a   Licitra, Christophe ^a   Rochat, Névine ^a   Gaumer, C ^b   Kaja, K ^a   Ghibaudo, Gérard ^c   Martin, François ^a   Reimbold, Gilles ^a  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

^c NONE

Author keywords

Capacitance versus voltage (CV); dipole; high ; internal photo emission (IPE); work function

Indexed keywords

DIPOLE; FABRICATION PROCESS; GATE STACKS; MAIN PROCESS; METAL GATE; METAL WORK FUNCTION; PROCESS CONDITION; TWO PARAMETER; VOLTAGE DROP;

CAPACITANCE; SILICON COMPOUNDS;

WORK FUNCTION;

EID: 77955166978     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2050957     Document Type: Article

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