Origin of the flat-band voltage (Vfb) roll-off phenomenon in metal/high-k gate stacks

ESSDERC 2008 - Proceedings of the 38th European Solid-State Device Research Conference

Volumn , Issue , 2008, Pages 134-137

  Bersuker, G ^a   Park, C S ^a   Wen, H C ^a   Choi, K ^a   Sharia, O ^b   Demkov, A ^b  

^a SEMATECH   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; OXYGEN VACANCIES;

FLAT BANDS; GATE STACKS; HIGH-K DIELECTRICS; K DIELECTRICS; POSITIVELY CHARGED; SUBSTRATE TYPES; VOLTAGE REDUCTIONS;

LOGIC GATES;

EID: 58049108590     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2008.4681717     Document Type: Conference Paper

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