Guidelines to improve mobility performances and BTI reliability of advanced High-K/Metal gate stacks

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2008, Pages 68-69

  Garros, X ^a   Casse M ^a   Reimbold, G ^a   Martin, F ^a   Leroux, C ^a   Fanton, A ^a   Renault, O ^a   Cosnier, V ^b   Boulanger, F ^a  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

TECHNOLOGY;

GATE STACKS; SYSTEMATIC STUDY; VLSI TECHNOLOGIES;

OXIDE FILMS;

EID: 51949098462     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2008.4588567     Document Type: Conference Paper

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7. Rafik et al, IEDM,2007
8. T. Matsuki, SISC, 2007
9. P. Batude et al., JAP, pp. 34514, 2007
10. G. Gerardi et al., APL, pp.348,1986
11. K. Mistry et al., IEDM, 2007