Microstructure control of CrNx films during high power impulse magnetron sputtering

Surface and Coatings Technology

Volumn 205, Issue 1, 2010, Pages 118-130

  Greczynski, G ^a   Jensen, J ^a   Bohlmark J ^b   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Sandvik Tooling   (Sweden)

Author keywords

CrN; High power impulse magnetron sputtering; High power pulsed magnetron sputtering; HIPIMS; HPPMS; Magnetron sputtering

Indexed keywords

AVERAGE SURFACE ROUGHNESS; COLUMNAR FILM GROWTH; COLUMNAR GROWTH; CRIII IONS; CRN; DENSE COLUMNAR STRUCTURES; ENERGY PER PULSE; FILM MORPHOLOGY; FILM STOICHIOMETRY; FILM-FORMING; FINER GRAINS; GAS RATIO; HIGH FLUX; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH POWER PULSED MAGNETRON SPUTTERING; HIGH SENSITIVITY; HIGH-POWER; HIGH-POWER PULSE; ION CONTENT; MATERIAL FLUXES; MEAN ENERGY; MICROSTRUCTURE CONTROL; NANOSIZED GRAINS; NEGATIVE SUBSTRATES; NITROGEN UPTAKE; PROCESS PARAMETERS; PULSE ENERGIES; PULSING FREQUENCIES; SELF-BIASED; TIME-AVERAGED; UNIQUE FEATURES;

CHROMIUM; CRYSTAL MICROSTRUCTURE; DC POWER TRANSMISSION; DEPOSITION RATES; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; GRAIN GROWTH; GRAIN SIZE AND SHAPE; IONS; MAGNETRON SPUTTERING; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SURFACE ROUGHNESS;

FILM GROWTH;

EID: 77954957777     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.06.016     Document Type: Article

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