Growth of CrNx films by DC reactive magnetron sputtering at constant N2/Ar gas flow

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 6047-6053

  Fornies E ^a   Escobar Galindo, R ^a   Sanchez O ^a   Albella, J M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

Bias; CrN; GDOES; Hardness; Pin on disk; Sputtering

Indexed keywords

COMPOSITION; CRYSTAL STRUCTURE; EMISSION SPECTROSCOPY; HARDNESS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CHROMIUM NITRIDE COATINGS; GLOW DISCHARGE OPTICAL EMISSION SPECTROSCOPY; NANOINDENTATION; PIN-ON-DISK EXPERIMENTS; POISONING EFFECT;

CHROMIUM COMPOUNDS;

CHROMIUM COMPOUNDS; COMPOSITION; CRYSTAL STRUCTURE; EMISSION SPECTROSCOPY; HARDNESS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EID: 33645807877     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.09.020     Document Type: Article

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